Vertically oriented, bandgap engineered silicon double tunnel junction nanopillars were fabricated and electrically addressed. The devices were tested at liquid nitrogen and room temperatures. Distinctive staircase steps in current were observed at cryogenic temperatures indicative of the Coulomb blockade effect present in asymmetric double tunnel junction structures. These features disappeared when the device was measured at room temperature
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
A study was performed on single-electron tunneling in InP nanowires. The contact resistances as low ...
Vertically oriented, bandgap engineered silicon double tunnel junction nanopillars were fabricated a...
Vertically oriented , bandgap engineered silicon nanopillars were fabricated and addressed. Devices ...
Coulomb blockade has been observed in the current-voltage characteristics of structures fabricated i...
Single charge electronics offer a way for disruptive technology in nanoelectronics. Coulomb blockade...
The Coulomb Blockade effect (CBE) is observed in double tunnel junctions where a small metallic clus...
An external electric field (up to 10(6) V/cm) was used for nanoscale p-n junction fabrication in Si ...
The Coulomb oscillations based on band-to-band tunneling through a valence band in silicon metal-oxi...
We have designed and manufactured silicon nanogaps aimed at electrically interfacing molecules, util...
This project develops a robust and reliable process to pattern sub 20 nm features in negative tone H...
We have designed and manufactured silicon nanogaps aimed at electrically interfacing molecules, util...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
A study was performed on single-electron tunneling in InP nanowires. The contact resistances as low ...
Vertically oriented, bandgap engineered silicon double tunnel junction nanopillars were fabricated a...
Vertically oriented , bandgap engineered silicon nanopillars were fabricated and addressed. Devices ...
Coulomb blockade has been observed in the current-voltage characteristics of structures fabricated i...
Single charge electronics offer a way for disruptive technology in nanoelectronics. Coulomb blockade...
The Coulomb Blockade effect (CBE) is observed in double tunnel junctions where a small metallic clus...
An external electric field (up to 10(6) V/cm) was used for nanoscale p-n junction fabrication in Si ...
The Coulomb oscillations based on band-to-band tunneling through a valence band in silicon metal-oxi...
We have designed and manufactured silicon nanogaps aimed at electrically interfacing molecules, util...
This project develops a robust and reliable process to pattern sub 20 nm features in negative tone H...
We have designed and manufactured silicon nanogaps aimed at electrically interfacing molecules, util...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used t...
A study was performed on single-electron tunneling in InP nanowires. The contact resistances as low ...