Detrapping phenomena in stressed MOS devices are observed by monitoring electrical characteristics after a constant current stress is applied. The see-saw behavior of the density of interface states and the subsequent partial recovery of the threshold voltage give evidence that detrapping occurs in the capacitor and transistor. Threshold voltage reversal has two components, thermal recovery (TR) and field-assisted-recovery (FAR). These results suggest the occurrence of a degradation reversal which could be of importance in future device design
We present and validate a physics-basedmodel for hot-carrier degradation. The model is based on a th...
none8siThis paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (...
This paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (MOS) fi...
An analysis of MOS transistor hot carrier degradation is presented, based upon experimental, simulat...
Degradation and recovery behaviors of n-channel metal-oxide-semiconductor field-effect transistors (...
A continued change of gate-controlled-diode characteristics of n-MOSFETs following hot-carrier injec...
We have studied in detail the hot-carrier induced degradation in polysilicon-emitter NPN bipolar jun...
A novel simulation-independent charge pumping (CP) technique is employed to accurately determine the...
We have studied the characteristics of MOSFET degradation induced by hot-carriers. When the characte...
Hot-carrier effects of n-clannel MOSFETs are investigated under a series of stress modes. A novel me...
Long-channel nMOSFETs have been electrically degraded by hot-carrier injection and the recovery at a...
In this paper the degradation in the drain current and threshold voltage of the N-MOS transistors ar...
In this paper, we investigate the influence of forward and reverse body bias stress on the hot carri...
International audienceThis paper presents a theoretical framework about interface states creation ra...
In this present communication, we have studied the effect of hot-carrier degradation effects on sur...
We present and validate a physics-basedmodel for hot-carrier degradation. The model is based on a th...
none8siThis paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (...
This paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (MOS) fi...
An analysis of MOS transistor hot carrier degradation is presented, based upon experimental, simulat...
Degradation and recovery behaviors of n-channel metal-oxide-semiconductor field-effect transistors (...
A continued change of gate-controlled-diode characteristics of n-MOSFETs following hot-carrier injec...
We have studied in detail the hot-carrier induced degradation in polysilicon-emitter NPN bipolar jun...
A novel simulation-independent charge pumping (CP) technique is employed to accurately determine the...
We have studied the characteristics of MOSFET degradation induced by hot-carriers. When the characte...
Hot-carrier effects of n-clannel MOSFETs are investigated under a series of stress modes. A novel me...
Long-channel nMOSFETs have been electrically degraded by hot-carrier injection and the recovery at a...
In this paper the degradation in the drain current and threshold voltage of the N-MOS transistors ar...
In this paper, we investigate the influence of forward and reverse body bias stress on the hot carri...
International audienceThis paper presents a theoretical framework about interface states creation ra...
In this present communication, we have studied the effect of hot-carrier degradation effects on sur...
We present and validate a physics-basedmodel for hot-carrier degradation. The model is based on a th...
none8siThis paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (...
This paper examines the impact of hot carriers (HCs) on n-channel metal-oxide-semiconductor (MOS) fi...