Thin Films of Cu-Doped CdS Prepared by a Pulsed Cathodic Deposition Method in Dimethylsulfoxide

Thin films of copper-doped CdS were prepared on conductive oxide substrates (FTO) by application of a cathodic current in an electrolyte bath of Cd2+, Cu2+, complexing agents, and S(0) in DMSO at elevated temperature with a duty cycle of 20%. Film thickness was controlled via the number of pulses and later confirmed by profilometry analysis. P-type conductivity was confirmed by open-circuit and Mott–Schottky analyses. Furthermore, the photoactivity of the films was assessed in neutral media using a three-electrode setup. By depositing this material onto the surface of a p-type oxygen-evolving catalyst (OEC) with suitable band structure, a z-scheme photocatalytic device can be produced and employed for water splitting