Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer‐Scale Spacings Created by Molecular Rulers

A hybrid approach to nanolithography combines conventional lithography with chemical self‐assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self‐assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication