Oxygen-deficient TiO2 films with enhanced visible and near-infrared optical absorption have been deposited by reactive sputtering using a planar diode radio frequency magnetron configuration. It is observed that the increase in the absorption coefficient is more effective when the O-2 gas supply is periodically interrupted rather than by a decrease of the partial O-2 gas pressure in the deposition plasma. The optical absorption coefficient at 1.5 eV increases from about 1 x 10(2) cm(-1) to more than 4 x 10(3) cm(-1) as a result of the gas flow discontinuity. A red-shift of similar to 0.24 eV in the optical absorption edge is also observed. High resolution transmission electron microscopy with composition analysis shows that the films presen...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
TiO2 thin films with various Mo concentrations have been deposited on glass and n‐type silicon (100)...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Oxygen-deficient TiO2 films with enhanced visible and near-infrared optical absorption have been dep...
The influence of sputtering parameters and annealing on the structure and optical properties of TiO2...
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by r...
Titanium dioxide is extensively used as high index material for multilayer optical thin film device ...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
Abstract Titanium dioxide (TiO2) thin films having anatase (1 0 1) crystal structure were prepared o...
In this work, TiO2 films, which were obtained by ion-plasma high-frequency magnetron sputtering of a...
Titanium dioxide (TiO2) is a very interesting material due to its number of applications, e.g., high...
The electronic properties of anatase titanium dioxide (TiO2) thin films epitaxially grown on LaAlO3s...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
We investigated the optical-response properties of nitrogen(N)-doped titanium dioxide (TiO2) film by...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
TiO2 thin films with various Mo concentrations have been deposited on glass and n‐type silicon (100)...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Oxygen-deficient TiO2 films with enhanced visible and near-infrared optical absorption have been dep...
The influence of sputtering parameters and annealing on the structure and optical properties of TiO2...
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by r...
Titanium dioxide is extensively used as high index material for multilayer optical thin film device ...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
Abstract Titanium dioxide (TiO2) thin films having anatase (1 0 1) crystal structure were prepared o...
In this work, TiO2 films, which were obtained by ion-plasma high-frequency magnetron sputtering of a...
Titanium dioxide (TiO2) is a very interesting material due to its number of applications, e.g., high...
The electronic properties of anatase titanium dioxide (TiO2) thin films epitaxially grown on LaAlO3s...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
We investigated the optical-response properties of nitrogen(N)-doped titanium dioxide (TiO2) film by...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
TiO2 thin films with various Mo concentrations have been deposited on glass and n‐type silicon (100)...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...