Bulk CMOS technologies left the semiconductor market to the novel device geometries such as FDSOI and FinFET below 30 nm, mainly due to their insufficient electrical characteristics arising from different physical limitations. These innovative solutions enabled the ongoing device scaling to continue. However, the threshold voltage and the power supply values did not shrink with the device sizes, which caused an excessive amount of heat generation in very small dimensions. With the high thermal resistivity materials used in FDSOI and FinFET, the generated heat cannot leave the device easily, which is not the case in bulk. With all of these, modern geometries brought a major problem, which is the self-heating. Due to self-heating effects (SH...
In this work, we study the impact of device self heating on Bulk and doublegate si...
In this work, we study the impact of device self heating on Bulk and doublegate si...
Abstract—In this work self-heating and its effect on device parameters are compared in 28 nm technol...
Thermal behaviours of high-performance digital circuits in bulk CMOS and FDSOI technologies are comp...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The microelectronic industry is in transition. At the device level, short-channel issues have led to...
Transistor self-heating is a grand challenge in modern integrated circuit (IC) chip designs. Chip-sc...
Transistor self-heating is a grand challenge in modern integrated circuit (IC) chip designs. Chip-sc...
This paper discusses self-heating (SHE) effects in silicon-on-insulator (SOI) CMOS technology and ap...
This paper discusses self-heating (SHE) effects in silicon-on-insulator (SOI) CMOS technology and ap...
In order to meet the specifications in terms of drive current and electrostatic channel control of n...
In this work, we study the impact of device self heating on Bulk and doublegate si...
In this work, we study the impact of device self heating on Bulk and doublegate si...
In this work, we study the impact of device self heating on Bulk and doublegate si...
Abstract—In this work self-heating and its effect on device parameters are compared in 28 nm technol...
Thermal behaviours of high-performance digital circuits in bulk CMOS and FDSOI technologies are comp...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The microelectronic industry is in transition. At the device level, short-channel issues have led to...
Transistor self-heating is a grand challenge in modern integrated circuit (IC) chip designs. Chip-sc...
Transistor self-heating is a grand challenge in modern integrated circuit (IC) chip designs. Chip-sc...
This paper discusses self-heating (SHE) effects in silicon-on-insulator (SOI) CMOS technology and ap...
This paper discusses self-heating (SHE) effects in silicon-on-insulator (SOI) CMOS technology and ap...
In order to meet the specifications in terms of drive current and electrostatic channel control of n...
In this work, we study the impact of device self heating on Bulk and doublegate si...
In this work, we study the impact of device self heating on Bulk and doublegate si...
In this work, we study the impact of device self heating on Bulk and doublegate si...
Abstract—In this work self-heating and its effect on device parameters are compared in 28 nm technol...