Plasma processes for novel detector fabrication

Plasmas have a wide range of uses from fluorescent light tubes to high technology semiconductor fabrication. In this work I will attempt to discuss a number of plasma processes which have been developed for standard semiconductor fabrication over recent years and apply them to producing detectors in a novel fashion. This will encompass the alteration of older existing processes used on silicon (Si) for use with a new detector material, silicon carbide (SiC). The other application which will be investigated is the use of processes to fabricate devices in indium tin oxide (ITO) which is a transparent conductive semiconductor used in making screens for laptop computers for a new application. ITO will used to produce a range of microelectrode arrays which can be used in neurophysiology studies using retinal tissue