Tunneling transport through the depletion layer under a GaAs {110} surface is studied with a low temperature scanning tunneling microscope (STM). The observed negative differential conductivity is due to a resonant enhancement of the tunneling probability through the depletion layer mediated by individual shallow acceptors. The STM experiment probes, for appropriate bias voltages, evanescent states in the GaAs band gap. Energetically and spatially resolved spectra show that the pronounced anisotropic contrast pattern of shallow acceptors occurs exclusively for this specific transport channel. Our findings suggest that the complex band structure causes the observed anisotropies connected with the zinc blende symmetry
Atomically resolved, voltage-dependent scanning tunneling microscopy (STM) images of GaAs(110) are c...
Scanning tunneling spectroscopy is used to study n-type GaAs(110) surfaces at temperatures near 10 K...
Low-temperature scanning tunneling spectroscopy measurements on semiconductor surface are described....
Tunneling transport through the depletion layer under a GaAs {110} surface is studied with a low tem...
The electronic properties of shallow acceptors in p-doped GaAs{110} are investigated with scanning t...
Scanning tunneling spectroscopy (STS) at 8 K is used to study single shallow acceptors embedded near...
In scanning tunneling experiments on semiconductor surfaces, the energy scale within the tunneling j...
We investigate the energy and symmetry of Zn and Be dopant-induced acceptor states in GaAs using cro...
In situ cleaved (110) surfaces of n-doped GaAs have been investigated by scanning tunneling microsc...
Local potential changes arising from nanoscale three-dimensional spatial fluctuations in the dopant ...
Cross-sectional scanning tunneling microscopy is used to identify the origin of the anisotropic elec...
Small numbers of nitrogen dopants dramatically modify the electronic properties of GaAs, generating ...
An individual Mn acceptor in GaAs is mapped by cross-sectional scanning tunneling microscopy (X-STM)...
Cross sectional scanning tunneling microscopy (X-STM) has now become a well established method for t...
We demonstrate the possibility of simultaneous determination of the type and electrical charge state...
Atomically resolved, voltage-dependent scanning tunneling microscopy (STM) images of GaAs(110) are c...
Scanning tunneling spectroscopy is used to study n-type GaAs(110) surfaces at temperatures near 10 K...
Low-temperature scanning tunneling spectroscopy measurements on semiconductor surface are described....
Tunneling transport through the depletion layer under a GaAs {110} surface is studied with a low tem...
The electronic properties of shallow acceptors in p-doped GaAs{110} are investigated with scanning t...
Scanning tunneling spectroscopy (STS) at 8 K is used to study single shallow acceptors embedded near...
In scanning tunneling experiments on semiconductor surfaces, the energy scale within the tunneling j...
We investigate the energy and symmetry of Zn and Be dopant-induced acceptor states in GaAs using cro...
In situ cleaved (110) surfaces of n-doped GaAs have been investigated by scanning tunneling microsc...
Local potential changes arising from nanoscale three-dimensional spatial fluctuations in the dopant ...
Cross-sectional scanning tunneling microscopy is used to identify the origin of the anisotropic elec...
Small numbers of nitrogen dopants dramatically modify the electronic properties of GaAs, generating ...
An individual Mn acceptor in GaAs is mapped by cross-sectional scanning tunneling microscopy (X-STM)...
Cross sectional scanning tunneling microscopy (X-STM) has now become a well established method for t...
We demonstrate the possibility of simultaneous determination of the type and electrical charge state...
Atomically resolved, voltage-dependent scanning tunneling microscopy (STM) images of GaAs(110) are c...
Scanning tunneling spectroscopy is used to study n-type GaAs(110) surfaces at temperatures near 10 K...
Low-temperature scanning tunneling spectroscopy measurements on semiconductor surface are described....