We report the deposition of thin Co2FeSi films by RF magnetron sputtering. Epitaxial (1 0 0)-oriented and L21 ordered growth is observed for films grown on MgO (1 0 0) substrates. (1 1 0)-oriented films on {\rm Al}_2{\rm O}_3\,(1\,1\,\bar{2}\,0) show several epitaxial domains in the film plane. Investigation of the magnetic properties reveals a saturation magnetization of 5.0 µB/fu at low temperatures. The temperature dependence of the resistivity ρxx(T) exhibits a crossover from a T3.5 law at T < 50 K to a T1.65 behaviour at elevated temperatures. ρxx(H) shows a small anisotropic magnetoresistive effect. A weak dependence of the normal Hall effect on the external magnetic field indicates the compensation of electron and hole like contribut...
Growth and magnetic characterization of thin films of Co2Cr0.6Fe0.4Al and Co2MnSi full-Heusler compo...
FeSi is a non-magnetic narrow-gap semiconductor that can be doped n-type by Co, which also gives ris...
Pulsed laser deposition was employed to grow thin films of the Heusler compounds Co2MnSi and Co2FeSi...
We report the deposition of thin Co2FeSi films by RF magnetron sputtering. Epitaxial (1 0 0)-oriente...
We have grown thin films of the Heusler compound Co2FeSi by RF magnetron sputtering. On (100)-orient...
We have grown thin films of the Heusler compound Co2FeSi by RF magnetron sputtering. On (100)-orient...
The structural and chemical order are the most important parameters governing the physical propertie...
We have successfully deposited epitaxial thin films of the Heusler alloy Co2FeSi on (1 0 0) cut SrTi...
The half-metallic properties of Heusler alloys make them ideal spin injectors for numerous spintroni...
Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure...
Element-specific magnetic properties of ultrathin epitaxial Co2FeSi( 110) films were measured using ...
Thin films of Co2MnSi have been grown on a-plane sapphire substrates from three elemental targets by...
Kammerer S, Heitmann S, Meyners D, et al. Room-temperature preparation and magnetic behavior of Co2M...
We investigate the structure and magneto-transport properties of thin films of the Co2Cr0.6Fe0.4Al ...
The influence of growth temperature T-s (300-773 K) on the structural phase ordering, static and dyn...
Growth and magnetic characterization of thin films of Co2Cr0.6Fe0.4Al and Co2MnSi full-Heusler compo...
FeSi is a non-magnetic narrow-gap semiconductor that can be doped n-type by Co, which also gives ris...
Pulsed laser deposition was employed to grow thin films of the Heusler compounds Co2MnSi and Co2FeSi...
We report the deposition of thin Co2FeSi films by RF magnetron sputtering. Epitaxial (1 0 0)-oriente...
We have grown thin films of the Heusler compound Co2FeSi by RF magnetron sputtering. On (100)-orient...
We have grown thin films of the Heusler compound Co2FeSi by RF magnetron sputtering. On (100)-orient...
The structural and chemical order are the most important parameters governing the physical propertie...
We have successfully deposited epitaxial thin films of the Heusler alloy Co2FeSi on (1 0 0) cut SrTi...
The half-metallic properties of Heusler alloys make them ideal spin injectors for numerous spintroni...
Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure...
Element-specific magnetic properties of ultrathin epitaxial Co2FeSi( 110) films were measured using ...
Thin films of Co2MnSi have been grown on a-plane sapphire substrates from three elemental targets by...
Kammerer S, Heitmann S, Meyners D, et al. Room-temperature preparation and magnetic behavior of Co2M...
We investigate the structure and magneto-transport properties of thin films of the Co2Cr0.6Fe0.4Al ...
The influence of growth temperature T-s (300-773 K) on the structural phase ordering, static and dyn...
Growth and magnetic characterization of thin films of Co2Cr0.6Fe0.4Al and Co2MnSi full-Heusler compo...
FeSi is a non-magnetic narrow-gap semiconductor that can be doped n-type by Co, which also gives ris...
Pulsed laser deposition was employed to grow thin films of the Heusler compounds Co2MnSi and Co2FeSi...