Effect of Hydrogen Gas Dilution on Sputtered Al:ZnO Film

AbstractAl doped zinc oxide (ZnO:Al) is a transparent and conductive oxide used as contact and antireflection layer in solar cell based on Si or chalcogenide. Generally it is grown by magnetron sputtering but the resistivity of our films grown with this technique are still in the order of 10-3Ωcm for layers grown at the temperatures used to produce the solar cells. The doping property of Hydrogen for Al:ZnO grown with two different sputtering techniques, DC magnetron sputtering and Pulsed magnetron sputtering at different growth parameters have been studied and the sample characterized optically, electrically and structurally. The best resistivity is 6.7*10-4Ωcm was obtained using Pulsed magnetron sputtering