Advances in Ultra Short Pulse Laser based Parallel Processing using a Spatial Light Modulator
- Dearden, G.
- Kuang, Z.
- Liu, D.
- Perrie, W.
- Edwardson, S.P.
- Watkins, K.G.
DOIAbstract
AbstractPresented here are latest advances in ultra short pulse laser based parallel processing using a spatial light modulator (SLM), which has the potential for use in high throughput precision patterning of photovoltaic and other device layers. Ultra short laser pulses allow selective material removal with minimal energy density, while here a computer- generated hologram driven reflective SLM is used to transform a single beam into multiple beamlets for increased process throughput. Based on this technique, the precision patterning of silicon, titanium, thin film ITO and metal on flexible and glass substrates is demonstrated and the benefits and current limitations discussed
Add to ORKG