Sub-Micron SNIS Josephson Junctions for Metrological Application

AbstractThe overdamped Nb/Al-AlOx/Nb superconductor-normal metal-insulator-superconductor SNIS Josephson junctions recently developed at INRIM exhibit high values of critical current density and characteristic voltage, making these devices appealing both for metrology and digital electronics. High current densities could allow reduction of junction size, increasing the integration level. In this work authors present first results concerning the realization of sub-μm SNIS including a nanolithographic technique (Electron Beam Lithography, EBL) into the conventional process, to reduce junction dimensions. Fabrication and electrical parameters have been evaluated considering the scaling of the areas of junctions, furthermore RF and temperature behaviour have been studied