AbstractLaser ablation of silicon is investigated with a large set of laser parameters to determine the ablation rate over five laser fluence decades. A thermodynamic model approach for the ablation of silicon has been derived. This simplified model determines the achievable ablation depth per pulse as a function of the applied laser fluence ranging from femtosecond to microsecond laser pulse duration. Furthermore different laser wavelengths from near-infrared to ultra-violet are investigated to determine the dependence on the optical penetration depth and on the ablation efficiency. The measured ablation depth per pulse is in agreement to the models predictions with the restrictions made
A computational model for the ablation of tooth enamel by ultra-short laser pulses is presented. The...
Laser excitation and damage in silicon is studied using Three-Temperature Model. The quasi-temperatu...
International audienceWe present experimental and theoretical studies of nanosecond ArF excimer lase...
Laser ablation of silicon is investigated with a large set of laser parameters to determine the abla...
AbstractLaser ablation of silicon is investigated with a large set of laser parameters to determine ...
In semiconductor industry, pulsed nanosecond lasers are widely applied for the separation of silicon...
The process of laser ablation of silicon targets with 1 ps/1055 nm and 100 fs/780 nm laser pulses ha...
This paper presents a simple method for estimating the ablation rate during drilling processes in cr...
We report on an experimental investigation of ultrafast laser ablation of silicon with bursts of pul...
AbstractLaser ablation of dielectrics from silicon substrates represents a useful technique for e.g....
Ž.The second harmonic of a pulsed Nd:YAG laser 532 nm has been used for the ablation of silicon samp...
Laser ablation of dielectrics from silicon substrates represents a useful technique for e.g. the cre...
AbstractSelective laser ablation of silicon nitride (SiNx) layers is a crucial technological step to...
Many laser ablation applications such as laser drilling and micromachining generate cavity structur...
A computational model for the ablation of tooth enamel by ultra-short laser pulses is presented. The...
A computational model for the ablation of tooth enamel by ultra-short laser pulses is presented. The...
Laser excitation and damage in silicon is studied using Three-Temperature Model. The quasi-temperatu...
International audienceWe present experimental and theoretical studies of nanosecond ArF excimer lase...
Laser ablation of silicon is investigated with a large set of laser parameters to determine the abla...
AbstractLaser ablation of silicon is investigated with a large set of laser parameters to determine ...
In semiconductor industry, pulsed nanosecond lasers are widely applied for the separation of silicon...
The process of laser ablation of silicon targets with 1 ps/1055 nm and 100 fs/780 nm laser pulses ha...
This paper presents a simple method for estimating the ablation rate during drilling processes in cr...
We report on an experimental investigation of ultrafast laser ablation of silicon with bursts of pul...
AbstractLaser ablation of dielectrics from silicon substrates represents a useful technique for e.g....
Ž.The second harmonic of a pulsed Nd:YAG laser 532 nm has been used for the ablation of silicon samp...
Laser ablation of dielectrics from silicon substrates represents a useful technique for e.g. the cre...
AbstractSelective laser ablation of silicon nitride (SiNx) layers is a crucial technological step to...
Many laser ablation applications such as laser drilling and micromachining generate cavity structur...
A computational model for the ablation of tooth enamel by ultra-short laser pulses is presented. The...
A computational model for the ablation of tooth enamel by ultra-short laser pulses is presented. The...
Laser excitation and damage in silicon is studied using Three-Temperature Model. The quasi-temperatu...
International audienceWe present experimental and theoretical studies of nanosecond ArF excimer lase...