AbstractWe present results on the light emission of Si nanocrystals embedded into a SiO2 matrix obtained via ion implantation. As measurement temperature increases, the main photoluminescence peak shows a shift which is consistent with recombination involving confined electronic states of the nanoparticles around 150 – 170 K when the emission shows a sudden blueshift. After that, the usual energy redshift as temperature increases follows again. It was showed before that silicon nanoparticles light emission present a coexistence of localized states (surface or interface, that dominate the emission spectra at room temperature) and confined states (quantum confinement, dominating the low temperature range). In this work we investigate whether ...
Silicon nanocrystals were prepared by Si+-ion implantation and subsequent annealing of SiO2 films t...
In this study, silicon nanocrystals embedded in SiO2 matrix were formed by conventional plasma enhan...
Si nanocrystals embedded in SiO2 matrix were prepared by co-sputtering method followed by a post ann...
International audienceWe study the origin of photoluminescence (PL) in Si nanocrystals embedded in a...
We report measurements of the temperature dependence of photoluminescence (PQ life-time and efficien...
A systematic study of photoluminescence (PL) behavior of Si nanocrystals in SiO2 obtained by ion imp...
A systematic study of photoluminescence (PL) behavior of Si nanocrystals in SiO2 obtained by ion imp...
A detailed analysis of the photoluminescence (PL) from Si nanocrystals (NCs) embedded in a silicon-r...
Photoluminescence (PL) spectra of Si nanocrystals (NCs) prepared by 130 keV Si ions implantation ont...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
Abstract. A possible mechanism for the photoemission from Si nanocrystals in an amorphous SiO2 matri...
Photoluminescence (PL) spectra of Si nanocrystals (NCs) prepared by 130 keV Si ions implantation ont...
Increasing temperature is known to quench the excitonic emission of bulk silicon, which is due to th...
Silicon nanocrystals were prepared by Si+-ion implantation and subsequent annealing of SiO2 films t...
In this study, silicon nanocrystals embedded in SiO2 matrix were formed by conventional plasma enhan...
Si nanocrystals embedded in SiO2 matrix were prepared by co-sputtering method followed by a post ann...
International audienceWe study the origin of photoluminescence (PL) in Si nanocrystals embedded in a...
We report measurements of the temperature dependence of photoluminescence (PQ life-time and efficien...
A systematic study of photoluminescence (PL) behavior of Si nanocrystals in SiO2 obtained by ion imp...
A systematic study of photoluminescence (PL) behavior of Si nanocrystals in SiO2 obtained by ion imp...
A detailed analysis of the photoluminescence (PL) from Si nanocrystals (NCs) embedded in a silicon-r...
Photoluminescence (PL) spectra of Si nanocrystals (NCs) prepared by 130 keV Si ions implantation ont...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
In this work we present a study of photoluminescence PL on Si nanocrystals NC produced by ion implan...
Abstract. A possible mechanism for the photoemission from Si nanocrystals in an amorphous SiO2 matri...
Photoluminescence (PL) spectra of Si nanocrystals (NCs) prepared by 130 keV Si ions implantation ont...
Increasing temperature is known to quench the excitonic emission of bulk silicon, which is due to th...
Silicon nanocrystals were prepared by Si+-ion implantation and subsequent annealing of SiO2 films t...
In this study, silicon nanocrystals embedded in SiO2 matrix were formed by conventional plasma enhan...
Si nanocrystals embedded in SiO2 matrix were prepared by co-sputtering method followed by a post ann...