AbstractZirconium nitride (ZrN) thin films were deposited on NiTi and Si substrates in the 23–570°C temperature range by direct current reactive magnetron sputtering using N2/Ar gas mixture. The film hardness, corrosion behavior, phase composition, and texture were determined. The deposited films were composed mainly by the cubic ZrN phase, whose texture varies with substrate temperature, changing progressively from (111) to (200) texture as the temperature increases. The hardness of the films is influenced by the texture and has a linear relationship with the ratio of the texture coefficients P(111)/P(200). The higher hardness is obtained for ZrN thin films with (200) texture. Electrochemical tests show that NiTi coated with (200)-oriented...
The effect of deposition temperature on microstructure and mechanical properties of ZrN coatings fab...
International audienceZr–Si–N films were deposited on silicon and steel substrates by magnetron sput...
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
AbstractZirconium nitride (ZrN) thin films were deposited on NiTi and Si substrates in the 23–570°C ...
Abstract—ZrNx/Zr ceramic/metal coatings were deposited onto NiTi shape-memory alloy using plasma imm...
[[abstract]]Nanocrystalline ZrN films were successfully deposited on Si(100) and AISI 304 stainless ...
[[abstract]]Nanocrystalline ZrN thin films were successfully deposited on Si (100) and AISI 316 stai...
[[abstract]]The purpose of this study was to investigate the effects of both bias voltage and heat t...
Thin zirconium nitride (ZrN) films were prepared by using reactive direct current (DC) magnetron spu...
This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and p...
AbstractThe crystallograpic structure and properties of Zirconium nitride (ZrN) films deposited on 3...
[[abstract]]This research studied the effect of bias on the microstructure and properties of zirconi...
[[abstract]]The corrosion resistance of ion-plated Zr, ZrN and ZrN/Zr films on commercial AISI 304 s...
DC reactive magnetron sputtering was used for the deposition of Zr–Si–N thin films. Four series of s...
AbstractNiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at dif...
The effect of deposition temperature on microstructure and mechanical properties of ZrN coatings fab...
International audienceZr–Si–N films were deposited on silicon and steel substrates by magnetron sput...
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
AbstractZirconium nitride (ZrN) thin films were deposited on NiTi and Si substrates in the 23–570°C ...
Abstract—ZrNx/Zr ceramic/metal coatings were deposited onto NiTi shape-memory alloy using plasma imm...
[[abstract]]Nanocrystalline ZrN films were successfully deposited on Si(100) and AISI 304 stainless ...
[[abstract]]Nanocrystalline ZrN thin films were successfully deposited on Si (100) and AISI 316 stai...
[[abstract]]The purpose of this study was to investigate the effects of both bias voltage and heat t...
Thin zirconium nitride (ZrN) films were prepared by using reactive direct current (DC) magnetron spu...
This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and p...
AbstractThe crystallograpic structure and properties of Zirconium nitride (ZrN) films deposited on 3...
[[abstract]]This research studied the effect of bias on the microstructure and properties of zirconi...
[[abstract]]The corrosion resistance of ion-plated Zr, ZrN and ZrN/Zr films on commercial AISI 304 s...
DC reactive magnetron sputtering was used for the deposition of Zr–Si–N thin films. Four series of s...
AbstractNiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at dif...
The effect of deposition temperature on microstructure and mechanical properties of ZrN coatings fab...
International audienceZr–Si–N films were deposited on silicon and steel substrates by magnetron sput...
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...