AbstractNiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different deposition rates and substrate temperatures were analyzed for their structure and mechanical properties. The crystalline structure, phase-transformation and mechanical response were characterized by X-ray diffraction (XRD), Differential Scanning Calorimetry (DSC) and Nanoindentation techniques, respectively. The films were deposited on silicon substrates maintained at temperatures in the range 300 to 500∘C and post-annealed at 600∘C for four hours to ensure film crystallinity. Films deposited at 300∘C and annealed for 600∘C have exhibited crystalline behavior with Austenite phase as the prominent phase. Deposition onto substrates held ...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin-films were deposited by DC magnetron sputtering from single alloy target (Ni/Ti: 45/55 aL....
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
AbstractNiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at dif...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
Thin films of NiTi were deposited by DC magnetron sputtering from an equiatomic alloy target (Ni/Ti:...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
The influence of annealing parameters on the martensitic phase transformation in sputter-deposited T...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin-films were deposited by DC magnetron sputtering from single alloy target (Ni/Ti: 45/55 aL....
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different d...
AbstractNiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at dif...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films de...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
Thin films of NiTi were deposited by DC magnetron sputtering from an equiatomic alloy target (Ni/Ti:...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
The influence of annealing parameters on the martensitic phase transformation in sputter-deposited T...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin films are usually sputtered on silicon wafers by magnetron sputtering. But the systems com...
NiTi thin-films were deposited by DC magnetron sputtering from single alloy target (Ni/Ti: 45/55 aL....