Reducing the resistivity of low temperature grown p-Al0.09Ga0.91N layers is crucial to improving the performance of GaN-based laser diodes. In this study, growth conditions of low temperature grown p-Al0.09Ga0.91N layers are monitored and the role of C impurity is investigated systematically. On the basis of the dependence of resistivity on C concentration and the photoluminescence analysis, it is found that C impurities act as donors in p-Al0.09Ga0.91N layer, and reducing the C concentration can reduce its compensation effect on Mg acceptor. Finally, a low resistivity of 4.2 Ω·cm is achieved for the low temperature grown p-Al0.09Ga0.91N
Post the commercialization and widespread use in light emitting diodes (LEDs), heterostructures of I...
The influence of the Mg doping profile on the electroluminescence (EL) efficiency of (AlGaIn)N quant...
Growth conditions have a tremendous impact on the unintentional background impurity concentration in...
Growth conditions were explored to suppress the carbon impurity incorporation in AlGaN:Mg grown at l...
The influence of unintentionally doped carbon impurities of i-GaN layer on the performance of GaN-ba...
P-type GaN was grown on Al3O2 substrate by low pressure metalorganic vapor phase epitaxy without any...
In GaN-based laser diode (LD) structures, Mg doping in p-type-doped layers has a significant influen...
We present a study on the high performance p-type AlxGa 1-xN (x=0.35) layers grown by low-pressure m...
The optoelectronics properties of Gallium Nitride and its alloys are attracting increasing interest ...
We report on a correlation between C-related deep-level defects and turn-on recovery characteristics...
In this work the optimisation of metal contacts to Ill-nitrides will be analysed together with the o...
Two series of p-GaN films grown at different temperatures are obtained by metal organic chemical vap...
The light ion impurities C, 0 and H have been implanted or diffused into GaN and related compounds a...
a low-temperature (LT)-AlN interlayer were proposed and fab-ricated. It was found that the dark curr...
Unintentionally doped semi-insulating GaN films possessing a low dislocation density are grown via m...
Post the commercialization and widespread use in light emitting diodes (LEDs), heterostructures of I...
The influence of the Mg doping profile on the electroluminescence (EL) efficiency of (AlGaIn)N quant...
Growth conditions have a tremendous impact on the unintentional background impurity concentration in...
Growth conditions were explored to suppress the carbon impurity incorporation in AlGaN:Mg grown at l...
The influence of unintentionally doped carbon impurities of i-GaN layer on the performance of GaN-ba...
P-type GaN was grown on Al3O2 substrate by low pressure metalorganic vapor phase epitaxy without any...
In GaN-based laser diode (LD) structures, Mg doping in p-type-doped layers has a significant influen...
We present a study on the high performance p-type AlxGa 1-xN (x=0.35) layers grown by low-pressure m...
The optoelectronics properties of Gallium Nitride and its alloys are attracting increasing interest ...
We report on a correlation between C-related deep-level defects and turn-on recovery characteristics...
In this work the optimisation of metal contacts to Ill-nitrides will be analysed together with the o...
Two series of p-GaN films grown at different temperatures are obtained by metal organic chemical vap...
The light ion impurities C, 0 and H have been implanted or diffused into GaN and related compounds a...
a low-temperature (LT)-AlN interlayer were proposed and fab-ricated. It was found that the dark curr...
Unintentionally doped semi-insulating GaN films possessing a low dislocation density are grown via m...
Post the commercialization and widespread use in light emitting diodes (LEDs), heterostructures of I...
The influence of the Mg doping profile on the electroluminescence (EL) efficiency of (AlGaIn)N quant...
Growth conditions have a tremendous impact on the unintentional background impurity concentration in...