Hard and tough coatings in the form of Cr/CrN bilayers were produced by reactive magnetron sputtering in Ar and Ar+N2 atmospheres respectively onto Si and Steel (H13) substrates. An unbalanced magnetron (GENCOA VT 100) and different Ar and N2 fluxes of 9 and 3 sccm respectively were used. The unbalanced geometric coefficient (KG) was varied between 1.37 and 0.87 by varying the magnetron position. Two series of coatings were produced. The first one of nine samples produced with three different bilayers periods and three different KG values and the second one with five samples produced with five different KG values. All coatings were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (ATM...
International audienceCrN/a-CNx nanolayered coatings have been deposited by DC reactive magnetron sp...
Thin (40 nm and 160 nm) CrN coatings were deposited on steel by reactive magnetron sputtering deposi...
CrN/CrAlN thin films were deposited by DC reactive magnetron sputtering. The influence of CrN/CrAlN ...
In this work, we present the results of Cr and CrN coatings deposited using unbalanced magnetron spu...
Chromium nitride (CrN) films have been applied to several steels as protective coatings against wear...
Single-phase CrN and CrAlN coatings were deposited on silicon and mild steel substrates using a reac...
In this work, an unbalanced magnetron sputtering system which allows for the production of corrosion...
The most widely used surface treatment to protect engineering components is the deposition of hard c...
Como recubrimientos duros y tenaces con aplicaciones tribológicas y anticorrosivas, se obtuvieron Na...
Nanoscale multilayer C/Cr coatings (bilayer thickness similar to2 nm) were produced by the combined ...
This work was aimed at evaluating the corrosion resistance of multilayer Cr/CrN coatings deposited b...
TiCrAlN and CrTiAlN multicomponent coatings have been developed using closed-field unbalanced magnet...
Approximately 1.5 x3BC;m thick CrN and CrAlN coatings were deposited on silicon and mild steel subst...
Abstract. Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a r...
CrN/CrCN/TaN multilayer films were deposited onto the CoCrMo alloy substrates at different number la...
International audienceCrN/a-CNx nanolayered coatings have been deposited by DC reactive magnetron sp...
Thin (40 nm and 160 nm) CrN coatings were deposited on steel by reactive magnetron sputtering deposi...
CrN/CrAlN thin films were deposited by DC reactive magnetron sputtering. The influence of CrN/CrAlN ...
In this work, we present the results of Cr and CrN coatings deposited using unbalanced magnetron spu...
Chromium nitride (CrN) films have been applied to several steels as protective coatings against wear...
Single-phase CrN and CrAlN coatings were deposited on silicon and mild steel substrates using a reac...
In this work, an unbalanced magnetron sputtering system which allows for the production of corrosion...
The most widely used surface treatment to protect engineering components is the deposition of hard c...
Como recubrimientos duros y tenaces con aplicaciones tribológicas y anticorrosivas, se obtuvieron Na...
Nanoscale multilayer C/Cr coatings (bilayer thickness similar to2 nm) were produced by the combined ...
This work was aimed at evaluating the corrosion resistance of multilayer Cr/CrN coatings deposited b...
TiCrAlN and CrTiAlN multicomponent coatings have been developed using closed-field unbalanced magnet...
Approximately 1.5 x3BC;m thick CrN and CrAlN coatings were deposited on silicon and mild steel subst...
Abstract. Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a r...
CrN/CrCN/TaN multilayer films were deposited onto the CoCrMo alloy substrates at different number la...
International audienceCrN/a-CNx nanolayered coatings have been deposited by DC reactive magnetron sp...
Thin (40 nm and 160 nm) CrN coatings were deposited on steel by reactive magnetron sputtering deposi...
CrN/CrAlN thin films were deposited by DC reactive magnetron sputtering. The influence of CrN/CrAlN ...