Abstract We investigate the thermal stability of alumina supporting layers sputtered at different conditions and its effect on the growth of aligned single-walled carbon nanotube arrays. Radio frequency magnetron sputtering of alumina under oxygen–argon atmosphere produces a Si-rich alumina alloy film on a silicon substrate. Atomic force microscopy on the annealed catalysts reveals that Si-rich alumina films are more stable than alumina layers with low Si content at the elevated temperatures at which the growth of single-walled carbon nanotubes is initiated. The enhanced thermal stability of the Si-rich alumina layer results in a narrower (< 2.2 nm) diameter distribution of the single-walled carbon nanotubes. Thanks to the smaller diameters...
Characteristics and role of Al oxide (Al-O) films used as catalyst-support layer for vertical growth...
We have studied the lifetime, activity, and evolution of Fe catalysts supported on different types o...
Atomic layer deposition (ALD) can be used to coat high aspect ratio and high surface area substrates...
We investigate the thermal stability of alumina supporting layers sputtered at different conditions ...
A precise control of the dimension of carbon nanotubes (CNTs) in their vertical array could enable m...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
Abstract Vertically aligned carbon nanotube arrays (VACNTs) show a great potential for various appli...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Characteristics and role of Al oxide (Al-O) films used as catalyst-supportlayer for vertical growth ...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Characteristics and role of Al oxide (Al-O) films used as catalyst-support layer for vertical growth...
We have studied the lifetime, activity, and evolution of Fe catalysts supported on different types o...
Atomic layer deposition (ALD) can be used to coat high aspect ratio and high surface area substrates...
We investigate the thermal stability of alumina supporting layers sputtered at different conditions ...
A precise control of the dimension of carbon nanotubes (CNTs) in their vertical array could enable m...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
Abstract Vertically aligned carbon nanotube arrays (VACNTs) show a great potential for various appli...
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), ...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Characteristics and role of Al oxide (Al-O) films used as catalyst-supportlayer for vertical growth ...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Controllable growth of carbon nanotube (CNT) arrays on carbon substrates requires an oxide buffer la...
Characteristics and role of Al oxide (Al-O) films used as catalyst-support layer for vertical growth...
We have studied the lifetime, activity, and evolution of Fe catalysts supported on different types o...
Atomic layer deposition (ALD) can be used to coat high aspect ratio and high surface area substrates...