Adsorption Structure of Mono- and Diradicals on a Cu(111) Surface: Chemoselective Dehalogenation of 4‑Bromo-3″-iodo‑<i>p</i>‑terphenyl

Selectivity is a key parameter for building customized organic nanostructures via bottom-up approaches. Therefore, strategies are needed that allow connecting molecular entities at a specific stage of the assembly process in a chemoselective manner. Studying the mechanisms of such reactions is the key to apply these transformations for the buildup of organic nanostructures on surfaces. Especially, the knowledge about the precise adsorption geometry of intermediates at different stages during the reaction process and their interactions with surface atoms or adatoms is of fundamental importance, since often catalytic processes are involved. We show the selective dehalogenation of 4-bromo-3″-iodo-p-terphenyl on the Cu(111) surface using bond imaging atomic force microscopy with CO-functionalized tips. The deiodination and debromination reactions are triggered either by heating or by locally applying voltage pulses with the tip. We observed a strong hierarchical behavior of the dehalogenation with respect to temperature and voltage. In connection with first-principles simulations we can determine the orientation and position of the pristine molecules as well as adsorbed mono/diradicals and the halogens. We find that the isolated radicals are chemisorbed to Cu(111) top sites, which are lifted by 16 pm (meta-position) and 32 pm (para-position) from the Cu surface plane. This leads to a strongly twisted and bent 3D adsorption structure. After heating, different types of dimers are observed whose molecules are either bound to surface atoms or connected via Cu adatoms. Such knowledge about the intermediate geometry and its interaction with the surface will open the way to rationally design syntheses on surfaces