Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVD
- Bartasyte, Ausrine
- Bouregba, R.
- Dogheche, El Hadj
- Boudard, Michel
- Poullain, G.
- Jiménez, Carmen
- Plausinaitiene, V.
- Remiens, Denis
- Abrutis, Adulfas
- Weiss, François
- Chaix-Pluchery, Odette
- Saltyte, Z.
DOIAbstract
International audienceThe influence of deposition conditions (pressure, growth rate, solution concentration, etc.) on the growth of ferroelectric PbTiO3 (PTO) films by pulsed liquid injection MOCVD was examined. Pb(thd)2 and Ti(OiPr)2(thd)2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate) dissolved in toluene were used as precursors. Films were grown on LaAlO3 (001) substrates for deposition process optimisation. PbTiO3/La1-xSrxMnO3/LaAlO3 heterostructures were elaborated at optimized deposition conditions. The microstructure of the heterostructures was characterized by X-ray Diffraction and by Raman spectroscopy. Pt/PbTiO3/La1-xSrxMnO3/LaAlO3 structures were used for ferroelectric, dielectric and piezoelectric characterisations of PTO films
Add to ORKG