The advances in optical projection lithography have ensured the steady continuation of Moore''s law. However, the wavelength of light sources has reached the lowest limit of 193-nm, and optical diffraction has become a major problem. Thus, other cost effective solutions are urgently needed. Electron-beam maskless lithography is a powerful technology capable of very-high resolution writing. However, electron-beam maskless lithography suffers from slow electron-beam scanning process and low throughput. In recent years, new research on multiple electron-beam direct-write systems that use massively parallel electron-beam emitters to achieve fast scanning process and high WPH has gained popularity. In multiple electron-beam direct-write systems,...
The character projection (CP) lithography is utilized for maskless lithography (ML2) and is a potent...
© 2016 ACM. Electron beam lithography (EBL) is a promising, maskless solution for the technology bey...
International audienceMassively parallel electron beam direct write (MP-EBDW) lithography is a cost-...
As technology develops, electronic devices are becoming faster, more power efficient, and smaller. A...
Future lithography systems must produce chips with smaller feature sizes, while maintaining throughp...
Future lithography systems must produce more dense chips with smaller feature sizes, while maintaini...
An efficient storage format was developed for computer-generated holograms for use in electron-beam ...
Achieving the throughput of one wafer per minute per layer with a direct-write maskless lithography ...
MAPPER Lithography is developing a maskless lithography technology. The technology combines massivel...
Electron beam direct writing technologies, specifically for the large area patterning of electronic ...
E-Beam direct writing (EBDW) requires no masks and affords high resolution. But its slow writing spe...
Using electron beam direct write (EBDW) as a complementary approach together with standard optical l...
Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white...
Electron beam lithography is limited by the extremely low throughput of currently working machines. ...
Maskless lithography based on electron beam parallelization requires well adapted data links, capabl...
The character projection (CP) lithography is utilized for maskless lithography (ML2) and is a potent...
© 2016 ACM. Electron beam lithography (EBL) is a promising, maskless solution for the technology bey...
International audienceMassively parallel electron beam direct write (MP-EBDW) lithography is a cost-...
As technology develops, electronic devices are becoming faster, more power efficient, and smaller. A...
Future lithography systems must produce chips with smaller feature sizes, while maintaining throughp...
Future lithography systems must produce more dense chips with smaller feature sizes, while maintaini...
An efficient storage format was developed for computer-generated holograms for use in electron-beam ...
Achieving the throughput of one wafer per minute per layer with a direct-write maskless lithography ...
MAPPER Lithography is developing a maskless lithography technology. The technology combines massivel...
Electron beam direct writing technologies, specifically for the large area patterning of electronic ...
E-Beam direct writing (EBDW) requires no masks and affords high resolution. But its slow writing spe...
Using electron beam direct write (EBDW) as a complementary approach together with standard optical l...
Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white...
Electron beam lithography is limited by the extremely low throughput of currently working machines. ...
Maskless lithography based on electron beam parallelization requires well adapted data links, capabl...
The character projection (CP) lithography is utilized for maskless lithography (ML2) and is a potent...
© 2016 ACM. Electron beam lithography (EBL) is a promising, maskless solution for the technology bey...
International audienceMassively parallel electron beam direct write (MP-EBDW) lithography is a cost-...