Due to coupling noises, process avariations, and power delivery fluctuations, design uncertainties of on-chip global interconnect systems rise sharply with deep-sub-micron (DSM) technology. It is increasingly difficult to assume deterministic and error-free signal transmission over global wires. Instead, on-chip global interconnect wires must be analyzed as an errorprone communication channel characterized by probability of bit error, and statistical timing distributions. In this paper, a novel statistical timing analysis approach is developed to analyze the behavior of two practically important pipelined multiple clock-cycle global interconnect architectures, namely, the flipflop inserted global wire and the latch inserted global wire. We ...
Global interconnect reliability is becoming a bigger issue as we scale down further into the submicr...
Abstract—In advanced technology nodes, incremental delay due to coupling is a serious concern. Desig...
With the aggressive scaling down of semiconductor VLSI devicesfrom 65nm to 45 nm, 32nm, the process ...
With deep submicron technologies, the importance of interconnect parasitics on delay and noise has b...
We study signal integrity effects on statistical timing analysis, e.g., interconnect and gate delay ...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
As the CMOS semiconductor technology enters nanometer regime, interconnect processes must be compati...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
With shrinking feature size and growing integration density in the Deep Sub- Micron (DSM) technologi...
In this paper, we highlight a fast, effective and practical statistical approach that deals with int...
Global interconnect is commonly regarded as a key potential bottleneck to the advancing performance ...
Timing analysis is a cornerstone of the digital design process. Statistical Static Timing Analysis w...
DoctorAggressive technology scaling in feature size has propelled designers to integrate millions of...
This work envisions a common design methodology, applicable for every interconnect level and based o...
Global interconnect reliability is becoming a bigger issue as we scale down further into the submicr...
Abstract—In advanced technology nodes, incremental delay due to coupling is a serious concern. Desig...
With the aggressive scaling down of semiconductor VLSI devicesfrom 65nm to 45 nm, 32nm, the process ...
With deep submicron technologies, the importance of interconnect parasitics on delay and noise has b...
We study signal integrity effects on statistical timing analysis, e.g., interconnect and gate delay ...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
As the CMOS semiconductor technology enters nanometer regime, interconnect processes must be compati...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
With shrinking feature size and growing integration density in the Deep Sub- Micron (DSM) technologi...
In this paper, we highlight a fast, effective and practical statistical approach that deals with int...
Global interconnect is commonly regarded as a key potential bottleneck to the advancing performance ...
Timing analysis is a cornerstone of the digital design process. Statistical Static Timing Analysis w...
DoctorAggressive technology scaling in feature size has propelled designers to integrate millions of...
This work envisions a common design methodology, applicable for every interconnect level and based o...
Global interconnect reliability is becoming a bigger issue as we scale down further into the submicr...
Abstract—In advanced technology nodes, incremental delay due to coupling is a serious concern. Desig...
With the aggressive scaling down of semiconductor VLSI devicesfrom 65nm to 45 nm, 32nm, the process ...