This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful for optical applications. The natural and controlled transparency and real refractive index of single layers of these trifluorides are examined and accompanied by studies of composition and crystal structure of the films which are made by conventional, high temperature, and ion-assisted thermal evaporation. Additionally, since these particular fluoride compounds provide an excellent opportunity for doing so, the mechanisms active in film modification through high temperature and ion-assisted thermal evaporation are explored
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
International audienceNd:LiYF4 (YLF) thin films were prepared on CaF2 or YLF substrates by pulsed la...
Aqueous precursor sets of orthoferrites were prepared by room temperature processing of inexpensive ...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
Lanthanide fluoride thin films have gained interest as materials for various optical applications, i...
The reflectances of single crystals of the trifluorides of La, Ce, Pr, Nd, Dy, and of polycrystallin...
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
Lanthanum oxyfluoride-based thin films were grown on SiO2 and Si(100) by CVD from La(hfa)3*diglyme (...
Highly luminescent Eu3+-doped LaOF thin films have been prepared by a sol-gel procedure using La(hfa...
Coatings and filters for spaceflight far-infrared components require a robust, non-absorptive low-in...
LaF3 thin films were prepared by thermal boat evaporation at different substrate temperatures and va...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
International audienceNd:LiYF4 (YLF) thin films were prepared on CaF2 or YLF substrates by pulsed la...
Aqueous precursor sets of orthoferrites were prepared by room temperature processing of inexpensive ...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
Lanthanide fluoride thin films have gained interest as materials for various optical applications, i...
The reflectances of single crystals of the trifluorides of La, Ce, Pr, Nd, Dy, and of polycrystallin...
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
Lanthanum oxyfluoride-based thin films were grown on SiO2 and Si(100) by CVD from La(hfa)3*diglyme (...
Highly luminescent Eu3+-doped LaOF thin films have been prepared by a sol-gel procedure using La(hfa...
Coatings and filters for spaceflight far-infrared components require a robust, non-absorptive low-in...
LaF3 thin films were prepared by thermal boat evaporation at different substrate temperatures and va...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
International audienceNd:LiYF4 (YLF) thin films were prepared on CaF2 or YLF substrates by pulsed la...
Aqueous precursor sets of orthoferrites were prepared by room temperature processing of inexpensive ...