A technique for modeling the effect of variations in multiple process parameters on circuit delay performance is proposed. The variation in saturation current I-on at the device level, and the variation in rising/failing edge stage delay for the NAND gate at the circuit level, are taken as performance metrics. The delay of a two-input NAND gate with 65 nm gate length transistors is extensively characterized by mixed-mode simulations, which is then used as a library element. Appropriate templates for the NAND gate library are incorporated in a general purpose circuit simulator SEQUEL. A 4-bit x 4-bit Wallace tree multiplier circuit, consisting of two-input NAND gates is used to demonstrate the proposed methodology. The variation in the multi...
Delay evaluation is always a crucial concern in the VLSI de-sign and it becomes increasingly more cr...
This paper presents a new model for CMOS structures delays estimation based on a deep analysis of co...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...
A technique for modeling the effect of variations in multiple process parameters on circuit delay pe...
A technique for modeling the effect of variations in multiple process parameters on circuit delay pe...
A novel methodology for modeling the effects of process variations on circuit delay performance is p...
A novel methodology for modeling the effects of process variations on circuit delay performance is p...
Ageneralized methodology formodeling the effects of process variations on circuit delay performance ...
A generalized methodology for modeling the effects of process variations on circuit delay performanc...
With the continued and successful scaling of CMOS, process, voltage, and temperature (PVT), variati...
Design closure in today\u27s advanced chip construction requires a delicate balance among various co...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
The growing impact of process variation on circuit performance requires statistical design approache...
Delay evaluation is always a crucial concern in the VLSI de-sign and it becomes increasingly more cr...
This paper presents a new model for CMOS structures delays estimation based on a deep analysis of co...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...
A technique for modeling the effect of variations in multiple process parameters on circuit delay pe...
A technique for modeling the effect of variations in multiple process parameters on circuit delay pe...
A novel methodology for modeling the effects of process variations on circuit delay performance is p...
A novel methodology for modeling the effects of process variations on circuit delay performance is p...
Ageneralized methodology formodeling the effects of process variations on circuit delay performance ...
A generalized methodology for modeling the effects of process variations on circuit delay performanc...
With the continued and successful scaling of CMOS, process, voltage, and temperature (PVT), variati...
Design closure in today\u27s advanced chip construction requires a delicate balance among various co...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
The growing impact of process variation on circuit performance requires statistical design approache...
Delay evaluation is always a crucial concern in the VLSI de-sign and it becomes increasingly more cr...
This paper presents a new model for CMOS structures delays estimation based on a deep analysis of co...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...