Analysis of drain current saturation behaviour in GaN polarisation super junction HFETs

The magnitude of saturation current in a power device significantly impacts its short-circuit capability. In conjunction with the unprecedented miniaturisation that gallium nitride (GaN) offers, there is a compelling rationale to examine this critical parameter in GaN transistors for thermally stable and reliable power converter applications. This study presents a comprehensive analysis of the physical behaviour that yields intrinsically low drain current saturation in GaN polarisation super junction heterojunction field-effect transistors (PSJ HFETs). The analysis in this work has been performed using electrical characterisation data of conventional and PSJ HFETs, supported by physics-based two-dimensional device simulations. Insight is gained on the differing device architecture-dependent mechanisms that determine the magnitude of drain current density in both types of devices when biased in the saturation region