Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N-2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7<lambda<7.0 nm. (C) 2010 Elsevier B.V. All rights reserved
B4C barrier layers are added to Mo/Si multilayer structures for EUV optics to enhance thermal stabil...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influe...
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influe...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
In theory La/B4C multilayer mirrors are a most promising optical elements for the future generation ...
A potential candidate for the new generation lithography beyond EUV is La/B4C multilayer optics for ...
We present a computational and experimental study on interface passivation of B4C/La multilayers for...
In the broad scientific field of thin films, applications have rapidly expanded since the second hal...
Radiation of 6.x nm wavelength is a possible candidate for the next generation of optical lithograph...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
B4C barrier layers are added to Mo/Si multilayer structures for EUV optics to enhance thermal stabil...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influe...
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influe...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
In theory La/B4C multilayer mirrors are a most promising optical elements for the future generation ...
A potential candidate for the new generation lithography beyond EUV is La/B4C multilayer optics for ...
We present a computational and experimental study on interface passivation of B4C/La multilayers for...
In the broad scientific field of thin films, applications have rapidly expanded since the second hal...
Radiation of 6.x nm wavelength is a possible candidate for the next generation of optical lithograph...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of L...
B4C barrier layers are added to Mo/Si multilayer structures for EUV optics to enhance thermal stabil...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-...