Considering recent modifications on n-type highly doped silicon parameters, an emitter optimization was made based on one-dimensional models with analytical solutions. In order to get good accuracy, a fifth order approximation has been considered. Two kinds of emitters, homogeneous and non-homogeneous, with phosphorus Gaussian profile emitter solar cells were optimized. According to our results: homogeneous emitter solar cells show their maximum efficiencies (<FONT FACE="Symbol">h @ 21.60-21.74%)</FONT>with doping levelsnus = 1x10(19) - 5x10(18) (cm-3) and (1.2-2.0) mum emitter thickness range. Non-homogeneous emitter solar cells provide a slightly higher efficiency (eta = 21.82-21.92%), with Ns = 1x10(20) (cm-3) with 2.0 mum thickness unde...
Epitaxial emitters grown by high temperature atmospheric pressure CVD can increase the spectral resp...
Increasing silicon solar cell efficiency plays a vital role in improving the dominant market share o...
This paper suggests epitaxy of silicon for emitter formation by high temperature CVD as an alternati...
This work focuses on studying two types of structure: homogeneous and double-diffused emitter silico...
A systematic experimental study is presented that aims at the optimization of the emitter of high-ef...
The emitter formation in industrial p-type silicon solar cells is generally done by phosphorus diffu...
In this work, we present an analysis on electrical performance of phosphorus diffused emitters on bl...
P+-type emitters were optimized keeping the base parameters constant. Updated internal parameters we...
One of the advantages of an epitaxially grown emitter is that its doping profile is not limited by t...
ABSTRACT: This paper describes the analysis and optimization of phosphorus-doped n+ emitters for Si ...
Abstract: The emitter formation constitutes a crucial step in the manufacturing of the crystalline s...
The selective emitter (SE) design, featuring lower doped areas between the front contact fingers and...
The selective emitter (SE) design, featuring lower doped areas between the front contact fingers and...
In this paper an optimization study for the oxide passivated selective emitter of high-efficiency Si...
AbstractIn this work we report on successful direct contacting of high sheet resistance (RSH) emitte...
Epitaxial emitters grown by high temperature atmospheric pressure CVD can increase the spectral resp...
Increasing silicon solar cell efficiency plays a vital role in improving the dominant market share o...
This paper suggests epitaxy of silicon for emitter formation by high temperature CVD as an alternati...
This work focuses on studying two types of structure: homogeneous and double-diffused emitter silico...
A systematic experimental study is presented that aims at the optimization of the emitter of high-ef...
The emitter formation in industrial p-type silicon solar cells is generally done by phosphorus diffu...
In this work, we present an analysis on electrical performance of phosphorus diffused emitters on bl...
P+-type emitters were optimized keeping the base parameters constant. Updated internal parameters we...
One of the advantages of an epitaxially grown emitter is that its doping profile is not limited by t...
ABSTRACT: This paper describes the analysis and optimization of phosphorus-doped n+ emitters for Si ...
Abstract: The emitter formation constitutes a crucial step in the manufacturing of the crystalline s...
The selective emitter (SE) design, featuring lower doped areas between the front contact fingers and...
The selective emitter (SE) design, featuring lower doped areas between the front contact fingers and...
In this paper an optimization study for the oxide passivated selective emitter of high-efficiency Si...
AbstractIn this work we report on successful direct contacting of high sheet resistance (RSH) emitte...
Epitaxial emitters grown by high temperature atmospheric pressure CVD can increase the spectral resp...
Increasing silicon solar cell efficiency plays a vital role in improving the dominant market share o...
This paper suggests epitaxy of silicon for emitter formation by high temperature CVD as an alternati...