The treatment of densification by vapor on pristineMWCNT bundles are necessary to improve the effective area of the CNT TSV. However, the CNT bundles might tilt partly because of the non-uniform densification at root of the bundle, especially when it comes to the high aspect ratio CNT bundles. In order to solve these problems, a double densification process has been proposed and developed here. First of all, the shape of partial densified CNT bundles were optimized as a function of time. After several steps such as transferring of partial densified CNT bundles into the via, second densification, epoxy filling and chemical mechanical polishing, the CNT filled TSV with aspect ratio of 10 was achieved. The current voltage response of the CNT T...
International audienceCarbon nanotubes (CNTs) due their unique mechanical, thermal, and elec...
We report on the fabrication and characterization of densified and transferred carbon nanotube fores...
We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition t...
A new and versatile vapor densification method is developed to fabricate various three-dimensional a...
High density electronics integration at the system level, supported by advanced packaging solutions,...
In integrated circuits the delay caused by interconnects, their power consumption, production and re...
Carbon nanotubes (CNTs) were proposed as a promising interconnection material in future miniaturized...
Carbon nanotubes (CNTs) are considered as a candidate material for future electronicinterconnect app...
Carbon nanotubes (CNT) are known to be materials with potential for manufacturing sub-20 nm high asp...
The feasibility of using carbon nanotube (CNT) bundles as the fillers of through silicon vias (TSVs)...
High density electronics integration at the system level, supported by advanced packaging solutions,...
Electrical and thermal management in nanodevices by means of carbon nanotube is highly promising. On...
We have demonstrated the fabrication of horizontally aligned carbon nanotube (CNT) bundles on Si sub...
Carbon nanotubes (CNT) are considered a promising material for interconnects for future generation m...
Carbon nanotubes (CNT) have been proposed for many applications in integrated circuits (IC): ranging...
International audienceCarbon nanotubes (CNTs) due their unique mechanical, thermal, and elec...
We report on the fabrication and characterization of densified and transferred carbon nanotube fores...
We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition t...
A new and versatile vapor densification method is developed to fabricate various three-dimensional a...
High density electronics integration at the system level, supported by advanced packaging solutions,...
In integrated circuits the delay caused by interconnects, their power consumption, production and re...
Carbon nanotubes (CNTs) were proposed as a promising interconnection material in future miniaturized...
Carbon nanotubes (CNTs) are considered as a candidate material for future electronicinterconnect app...
Carbon nanotubes (CNT) are known to be materials with potential for manufacturing sub-20 nm high asp...
The feasibility of using carbon nanotube (CNT) bundles as the fillers of through silicon vias (TSVs)...
High density electronics integration at the system level, supported by advanced packaging solutions,...
Electrical and thermal management in nanodevices by means of carbon nanotube is highly promising. On...
We have demonstrated the fabrication of horizontally aligned carbon nanotube (CNT) bundles on Si sub...
Carbon nanotubes (CNT) are considered a promising material for interconnects for future generation m...
Carbon nanotubes (CNT) have been proposed for many applications in integrated circuits (IC): ranging...
International audienceCarbon nanotubes (CNTs) due their unique mechanical, thermal, and elec...
We report on the fabrication and characterization of densified and transferred carbon nanotube fores...
We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition t...