We present our recent researches on novel group IV nano- and micro-structures for potential light sources on Si, including the tensile strained Ge quantum dots (QDs), GeSn thin films and microstructures, and Ge(Sn) nanowires. Tensile-strained Ge QDs were grown by SS-MBE, and photoluminescence was achieved. The GeSn thin films were demonstrated with Sn concentration above the bandgap transition critical point, and partially suspended GeSn microstructures were fabricated for relaxing the compressive strain
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
It has been theoretically predicted that 1.9% biaxial tensile strain can convert Ge [1], which is co...
The development of information technology during the last century was substantially pushed forward b...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
Sn-based group IV semiconductors have attracted increasing scientific interest duringthe last decade...
Sn-based group IV semiconductors have attracted increasing scientific interest duringthe last decade...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Abstract Strain-engineered self-assembled GeSn/GeSiSn quantum dots in Ge matrix have been numericall...
Sn-based group IV semiconductors have attracted increasing scientific interest during the last decad...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
It has been theoretically predicted that 1.9% biaxial tensile strain can convert Ge [1], which is co...
The development of information technology during the last century was substantially pushed forward b...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
Sn-based group IV semiconductors have attracted increasing scientific interest duringthe last decade...
Sn-based group IV semiconductors have attracted increasing scientific interest duringthe last decade...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...
Abstract Strain-engineered self-assembled GeSn/GeSiSn quantum dots in Ge matrix have been numericall...
Sn-based group IV semiconductors have attracted increasing scientific interest during the last decad...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
Highly tensile-strained Ge quantum dots (TS-Ge-QDs) emitting structures with different size were suc...
The photoluminescence of process-induced tensile strained nanostructures fabricated using Ge on Si i...