We present a novel computational schemeto predict chemical compositions at interfacesas they emerge in a growth process.The scheme uses the Gibbs free energy of reaction associatedwith the formation of interfaces with a specific compositionas predictor for their prevalence.It explicitly accounts for the growth conditions by rate-equation modeling of the deposition environment.We illustrate the scheme for characterizing the interfacebetween TiC and alumina
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
In this thesis, a new methodology for designing, evaluating and comparing interface structures is pr...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We investigate the chemical composition and adhesion of chemical vapour deposited thin-film alumina ...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
This thesis deals with two closely interwoven aspects of first-principle(density functional theory) ...
Chemical reactions at solid/liquid or solid/gas hybrid interfaces govern the morphogenesis of growi...
International audienceMastering interfacial layers is the current challenge for nanotechnologies whe...
Multiscale modelling of hardening precipitate interfaces in alloy design This project will develop a...
Chemical vapor deposition (CVD) processes are often employed to produce high quality materials. In s...
Computational modeling of organic interface formation on semiconductors poses a challenge to a densi...
Many aspects of the behavior of bulk materials are determined by the properties of interfaces. In th...
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
In this thesis, a new methodology for designing, evaluating and comparing interface structures is pr...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We investigate the chemical composition and adhesion of chemical vapour deposited thin-film alumina ...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
This thesis deals with two closely interwoven aspects of first-principle(density functional theory) ...
Chemical reactions at solid/liquid or solid/gas hybrid interfaces govern the morphogenesis of growi...
International audienceMastering interfacial layers is the current challenge for nanotechnologies whe...
Multiscale modelling of hardening precipitate interfaces in alloy design This project will develop a...
Chemical vapor deposition (CVD) processes are often employed to produce high quality materials. In s...
Computational modeling of organic interface formation on semiconductors poses a challenge to a densi...
Many aspects of the behavior of bulk materials are determined by the properties of interfaces. In th...
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
In this thesis, a new methodology for designing, evaluating and comparing interface structures is pr...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...