A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on several different light-emitting low-molar-mass organic semiconductors, without any degradation of the active materials after patterning (see Figure). This could be the only process that permits the transfer of a height profile to films of this very important class of low-molar-mass conjugated molecules with poor thermoplastic behavior
A status report of nanoimprint lithography is given in the context of alternative nanofabrication me...
The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithog...
In this chapter we review the use of nanoimprint lithography and its derivative soft-lithography tec...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
Thin films made of organic semiconductors (-sexithiophene, PDAS and PBAS) have been printed and the ...
We demonstrate the multilevel patterning of organic light-emitting polymers by room-temperature nano...
We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achi...
Abstract—We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning t...
Nanoimprint Lithography (NIL) technique has attracted widespread interest in both academic research ...
We report on the nanopatterning of conjugated polymers by soft molding, and exploit the glass trans...
We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refr...
We implemented and developed a number of different mechanical patterning methods, including soft hot...
We employed nanoimprint lithography and soft moulding techniques to print one-dimensional nanostruct...
A status report of nanoimprint lithography is given in the context of alternative nanofabrication me...
The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithog...
In this chapter we review the use of nanoimprint lithography and its derivative soft-lithography tec...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on s...
Thin films made of organic semiconductors (-sexithiophene, PDAS and PBAS) have been printed and the ...
We demonstrate the multilevel patterning of organic light-emitting polymers by room-temperature nano...
We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achi...
Abstract—We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning t...
Nanoimprint Lithography (NIL) technique has attracted widespread interest in both academic research ...
We report on the nanopatterning of conjugated polymers by soft molding, and exploit the glass trans...
We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refr...
We implemented and developed a number of different mechanical patterning methods, including soft hot...
We employed nanoimprint lithography and soft moulding techniques to print one-dimensional nanostruct...
A status report of nanoimprint lithography is given in the context of alternative nanofabrication me...
The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithog...
In this chapter we review the use of nanoimprint lithography and its derivative soft-lithography tec...