© 2016 Elsevier B.V. All rights reserved.Thin Fe57 films with the thickness of 120 nm have been prepared on glass substrates by using the ion-beam-assisted deposition technique. X-ray diffraction, electron microdiffraction and Mössbauer spectroscopy studies have shown that as-deposited films are in a stressful nanostructured state containing the nanoscaled inclusions of α-phase iron with the size of ∼10 nm. Room temperature in-plane and out-of-plane magnetization measurements confirmed the presence of the magnetic α-phase in the iron film and indicated the strong effect of residual stresses on magnetic properties of the film as well. Subsequent thermal annealing of iron films in vacuum at the temperature of 450 °C stimulates the growth of α...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
© 2016 Elsevier B.V. All rights reserved.Thin Fe57 films with the thickness of 120 nm have been prep...
© 2019 Elsevier Ltd Thin films of iron with different thickness (⁓40–300 nm) were deposited on quart...
© 2019 Elsevier Ltd Thin films of iron with different thickness (⁓40–300 nm) were deposited on quart...
Thin films of iron with different thickness (⁓40-300 nm) were deposited on quartz and silicon substr...
The paper presents the results of Mossbauer effect studies of thin iron films obtained by ion-assist...
© 2018 Institute of Physics Publishing. All rights reserved. The paper presents the results of Mössb...
© 2018 Institute of Physics Publishing. All rights reserved. The paper presents the results of Mössb...
A combination of analytical techniques, with special emphasis on selective area Stokes polarimetry, ...
Fe73.9Cu1Nb3Si13.2B8.9 thin films were deposited on the glass substrates by means of ion-plasma radi...
A combination of analytical techniques, with special emphasis on selective area Stokes polarimetry, ...
Films of Fe0.79Ge0.21 with thicknesses of 300 nm were synthesized by ion beam sputtering, and were a...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
© 2016 Elsevier B.V. All rights reserved.Thin Fe57 films with the thickness of 120 nm have been prep...
© 2019 Elsevier Ltd Thin films of iron with different thickness (⁓40–300 nm) were deposited on quart...
© 2019 Elsevier Ltd Thin films of iron with different thickness (⁓40–300 nm) were deposited on quart...
Thin films of iron with different thickness (⁓40-300 nm) were deposited on quartz and silicon substr...
The paper presents the results of Mossbauer effect studies of thin iron films obtained by ion-assist...
© 2018 Institute of Physics Publishing. All rights reserved. The paper presents the results of Mössb...
© 2018 Institute of Physics Publishing. All rights reserved. The paper presents the results of Mössb...
A combination of analytical techniques, with special emphasis on selective area Stokes polarimetry, ...
Fe73.9Cu1Nb3Si13.2B8.9 thin films were deposited on the glass substrates by means of ion-plasma radi...
A combination of analytical techniques, with special emphasis on selective area Stokes polarimetry, ...
Films of Fe0.79Ge0.21 with thicknesses of 300 nm were synthesized by ion beam sputtering, and were a...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...
High flux, low energy He plasma exposure is proven to nanostructure iron thin films over their entir...