Copper oxide (Cu2O, Cu4O3 and CuO) thin films have been deposited on unmatched substrates by sputtering at room temperature. The influence of oxygen flow rate and total pressure on the film structure and preferred orientation has been studied. The total pressure is a relevant parameter to control the texture of Cu2O and Cu4O3 films, while the oxygen flow rate is effective to tune the preferred orientation of CuO films. Local epitaxial growth, where epitaxial relationship exists in columns of sputtered films, has been observed in Cu2O and Cu4O3 films by using a seed layer. The seed layer will govern the growth orientation of top layer via the local epitaxy, independently of the deposition conditions of top layer. Unusual microstructure that ...
Cu2O semiconductor thin films are deposited by SILAR Method at 70°C temperature on commercial micro...
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass substrates by d...
A detailed study of the oxidation of Cu substrates was carried out under controlled conditions by re...
Accès restreint aux membres de l'Université de Lorraine jusqu'au 2016-02-16Copper oxide (Cu2O, Cu4O3...
International audienceBinary copper oxide (Cu2O, Cu4O3 and CuO) thin films have been selectively dep...
International audienceWe report the homoepitaxial growth of Cu2O thin films with tunable growth orie...
The deposition of thin copper oxide films by reactive sputtering has been investigated from both exp...
Copper oxide thin films are grown by reactive magnetron sputter deposition. To define the parameter ...
Thin films of copper oxide were grown by radio frequency-magnetron sputtering in an oxygen-argon env...
High-quality copper oxide (CuO) thin films were deposited on the silicon (Si) substrate at the room ...
Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposit...
The Cu2O and CuO thin films were synthesized by using RF sputtering technique. Comparisons were made...
Mono phase CuO thin films through DC sputtering at various oxygen pressure (10, 20, 30, 40 sccm) was...
Diode r.f. sputtering in oxygen-argon mixtures has been used to produce thin copper oxide films with...
A series of copper oxide thin films were synthesized through direct current magnetron sputtering on ...
Cu2O semiconductor thin films are deposited by SILAR Method at 70°C temperature on commercial micro...
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass substrates by d...
A detailed study of the oxidation of Cu substrates was carried out under controlled conditions by re...
Accès restreint aux membres de l'Université de Lorraine jusqu'au 2016-02-16Copper oxide (Cu2O, Cu4O3...
International audienceBinary copper oxide (Cu2O, Cu4O3 and CuO) thin films have been selectively dep...
International audienceWe report the homoepitaxial growth of Cu2O thin films with tunable growth orie...
The deposition of thin copper oxide films by reactive sputtering has been investigated from both exp...
Copper oxide thin films are grown by reactive magnetron sputter deposition. To define the parameter ...
Thin films of copper oxide were grown by radio frequency-magnetron sputtering in an oxygen-argon env...
High-quality copper oxide (CuO) thin films were deposited on the silicon (Si) substrate at the room ...
Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposit...
The Cu2O and CuO thin films were synthesized by using RF sputtering technique. Comparisons were made...
Mono phase CuO thin films through DC sputtering at various oxygen pressure (10, 20, 30, 40 sccm) was...
Diode r.f. sputtering in oxygen-argon mixtures has been used to produce thin copper oxide films with...
A series of copper oxide thin films were synthesized through direct current magnetron sputtering on ...
Cu2O semiconductor thin films are deposited by SILAR Method at 70°C temperature on commercial micro...
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass substrates by d...
A detailed study of the oxidation of Cu substrates was carried out under controlled conditions by re...