Titanium nitride coatings (TiN) deposited by the promising technique high power impulse magnetron sputtering (HiPIMS) has been investigated as a mean of improving the surface properties of the CoCr-based medical implant grade (ASTM F75). HiPIMS is a physical vapour deposition (PVD) technique that applies very short pulses of very high power to the target followed by periods of no applied power. The HiPIMS plasma discharge contains a large fraction of target ions (in this work Ti-ions). By applying a negative bias to the substrate the Ti-ions can be accelerated towards the substrate and used for etching away oxides on the substrate surface. This technique of pre-treating the substrate prior to deposition of TiN coatings was extensively exami...
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with hi...
An unbalanced physical vapor deposition (PVD) magnetron sputtering technique was used to deposit a t...
The aim of this work was to develop a plasma nitriding process for a bio-grade CoCrMo alloy using a ...
Titanium nitride coatings (TiN) deposited by the promising technique high power impulse magnetron sp...
Titanium nitride coatings (TiN) deposited by the promising technique high power impulse magnetron sp...
The aim of this study was to develop thin film coatings for total knee replacement joints using high...
TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode...
CNPQ - CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICOIon bombardment during film grow...
The demand for improvement of lifetime and biocompatibility of medical implants is ever growing. The...
High power impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition ...
This study describes the performance of nanoscale multilayer TiN/NbN coatings deposited on CoCrMo me...
The objective in this investigation was to design and commission a magnetron sputter deposition syst...
HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the depositio...
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel h...
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel h...
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with hi...
An unbalanced physical vapor deposition (PVD) magnetron sputtering technique was used to deposit a t...
The aim of this work was to develop a plasma nitriding process for a bio-grade CoCrMo alloy using a ...
Titanium nitride coatings (TiN) deposited by the promising technique high power impulse magnetron sp...
Titanium nitride coatings (TiN) deposited by the promising technique high power impulse magnetron sp...
The aim of this study was to develop thin film coatings for total knee replacement joints using high...
TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode...
CNPQ - CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICOIon bombardment during film grow...
The demand for improvement of lifetime and biocompatibility of medical implants is ever growing. The...
High power impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition ...
This study describes the performance of nanoscale multilayer TiN/NbN coatings deposited on CoCrMo me...
The objective in this investigation was to design and commission a magnetron sputter deposition syst...
HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the depositio...
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel h...
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel h...
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with hi...
An unbalanced physical vapor deposition (PVD) magnetron sputtering technique was used to deposit a t...
The aim of this work was to develop a plasma nitriding process for a bio-grade CoCrMo alloy using a ...