In the present work, the surface properties of various Al oxide films were investigated. The oxide films were produced on a stainless steel by spray pyrolysis and cathodic deposition methods. The films obtained represent typical layers that can be used as a support in model systems to investigate alumina-based catalysts. Information about the chemical environment of the Al and O ions in the oxide films depending on the preparation conditions has been deduced from the binding energies of the Al 2p and O Is electron core levels and corresponding Auger parameters
Tarkista embargo, kun artikkeli julkaistu.Atomic-layer-deposited Al 2 O 3 films can be used for pass...
Multiple in situ diagnostics have been employed to study the reaction mechanism of plasma-assisted A...
This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by th...
where the asterisks designate the surface species. Growth of stoichiometric Al2O3 thin films with ca...
Al2O3 thin films are deposited on the surface of 304 stainless steel by electrodeposition-pyrolysis,...
We have investigated the deposition of ZrO2 and Al2O3 films on a stainless steel (SS) substrate by s...
Aluminium oxide thin films were prepared by the ALE process using AICI3 and A1(OR)3 (R = Et,Pr) as a...
Thin alumina films were deposited at low temperatures (290–420°C) on stainless steel, type AISI 304....
In this paper, physiochemical properties of amorphous alumina thin films, grown by the metal organic...
Al2O3 films with thickness ranging from 20 to 300 nm are grown in a home-made reactor using atomic l...
The optical, structural, and electrical characteristics of aluminum oxide thin films deposited by pu...
Al2O3 thin films find a no. of applications in optoelectronic sensors and tribol. In this paper, th...
An ultra-thin and homogeneous alumina film is prepared by deposition and oxidation of aluminum on a ...
Al2O3 layers with thicknesses in the 25–120 nm range were deposited by plasma enhanced atomic layer ...
Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for t...
Tarkista embargo, kun artikkeli julkaistu.Atomic-layer-deposited Al 2 O 3 films can be used for pass...
Multiple in situ diagnostics have been employed to study the reaction mechanism of plasma-assisted A...
This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by th...
where the asterisks designate the surface species. Growth of stoichiometric Al2O3 thin films with ca...
Al2O3 thin films are deposited on the surface of 304 stainless steel by electrodeposition-pyrolysis,...
We have investigated the deposition of ZrO2 and Al2O3 films on a stainless steel (SS) substrate by s...
Aluminium oxide thin films were prepared by the ALE process using AICI3 and A1(OR)3 (R = Et,Pr) as a...
Thin alumina films were deposited at low temperatures (290–420°C) on stainless steel, type AISI 304....
In this paper, physiochemical properties of amorphous alumina thin films, grown by the metal organic...
Al2O3 films with thickness ranging from 20 to 300 nm are grown in a home-made reactor using atomic l...
The optical, structural, and electrical characteristics of aluminum oxide thin films deposited by pu...
Al2O3 thin films find a no. of applications in optoelectronic sensors and tribol. In this paper, th...
An ultra-thin and homogeneous alumina film is prepared by deposition and oxidation of aluminum on a ...
Al2O3 layers with thicknesses in the 25–120 nm range were deposited by plasma enhanced atomic layer ...
Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for t...
Tarkista embargo, kun artikkeli julkaistu.Atomic-layer-deposited Al 2 O 3 films can be used for pass...
Multiple in situ diagnostics have been employed to study the reaction mechanism of plasma-assisted A...
This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by th...