Integrated circuits constitute a complex mosaic, where materials with different characteristics, grown or deposited in different ways and at different temperatures, are linked together in various geometries. It is well known that during and after processing of these devices, mechanical stresses develop in the layers. These stresses may be due to thermal steps, intrinsic stresses, which are inherent in the formation process of the film, or due to the geometry of the material. For example, high stresses are present in the substrate at film edges. The presence of local residual stress has an important effect on the electrical properties of electronic devices, in particular on the reliability and the lifetime of the semiconductor components. Th...
ISBN 978-1-4577-0623-3International audienceSome industrial areas as oil, automotive and aerospace i...
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
International audienceThe stress distribution on crack free thick continuous GaN film (12 mu m) grow...
Integrated circuits constitute a complex mosaic, where materials with different characteristics, gro...
In semiconductor devices manufacturing, various materials with different physico-chemical characteri...
Bonding of LEDs on substrates by soldering or sintering induce stresses in the LEDs. Raman spectrosc...
Thermomechanical stress due to tensile and compressive strain is a critical aspect in packaging tech...
Local thermomechanical stress can cause failures in semiconductor packages during long time operatio...
Typical failures in microelectronics range from misalignments, non-uniform filling, delamination, mi...
Mechanical stress is developed in the materials during and after manufacturing of devices. In microe...
AbstractLocal thermomechanical stress can cause failures in semiconductor packages during long‐time ...
The stress states in unintentionally doped GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane...
We are grateful to the scientific grant agency of the Ministry of Education, Science, Resea...
The growing interest in improving optoelectronic devices requires continuous research of the materia...
Thermomechanical stress in microelectronics packaging systems is a very complex phenomenon. Understa...
ISBN 978-1-4577-0623-3International audienceSome industrial areas as oil, automotive and aerospace i...
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
International audienceThe stress distribution on crack free thick continuous GaN film (12 mu m) grow...
Integrated circuits constitute a complex mosaic, where materials with different characteristics, gro...
In semiconductor devices manufacturing, various materials with different physico-chemical characteri...
Bonding of LEDs on substrates by soldering or sintering induce stresses in the LEDs. Raman spectrosc...
Thermomechanical stress due to tensile and compressive strain is a critical aspect in packaging tech...
Local thermomechanical stress can cause failures in semiconductor packages during long time operatio...
Typical failures in microelectronics range from misalignments, non-uniform filling, delamination, mi...
Mechanical stress is developed in the materials during and after manufacturing of devices. In microe...
AbstractLocal thermomechanical stress can cause failures in semiconductor packages during long‐time ...
The stress states in unintentionally doped GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane...
We are grateful to the scientific grant agency of the Ministry of Education, Science, Resea...
The growing interest in improving optoelectronic devices requires continuous research of the materia...
Thermomechanical stress in microelectronics packaging systems is a very complex phenomenon. Understa...
ISBN 978-1-4577-0623-3International audienceSome industrial areas as oil, automotive and aerospace i...
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
International audienceThe stress distribution on crack free thick continuous GaN film (12 mu m) grow...