Mixed-mode deposition of carbon is an extension of high-power impulse magnetron sputtering in which a short-lived arc is deliberately allowed to ignite on the target surface to increase the ionised fraction of carbon in the deposition flux. Here we investigate the ignition and evolution of these arcs and examine their behaviour for different conditions of argon pressure, power supply voltage, and current. We find that mixed-mode deposition is sensitive to the condition of the target surface, and changing the operating parameters causes changes in the target surface condition which themselves affect the discharge in a process of negative feedback. Initially the arcs are evenly distributed on the target racetrack, but after a long period of o...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Magnetron sputtering combines a glow discharge with sputtering from a target that simultaneously ser...
Arcing phenomena was investigated in DC magnetron sputtering of AZO target. Arc count was found to d...
Diamond like carbon (DLC) is a metastable state of amorphous carbon that has very important and wide...
Arcing is a well-known, unwanted discharge regime observed on the surface of sputtering targets. The...
© 2016 Author(s). High-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carb...
Carbon films were produced by triggering a cathodic arc from a magnetron glow discharge by the appli...
The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering disc...
Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at p...
Film formation by energetic condensation has been shown to lead to well-adherent, dense films. Films...
The recent trend in thin film deposition is to prepare ceramic films capable of enduring violent env...
Investigation results of the structure, mechanical, tribological and adhesion characteristics of car...
Ion mass spectrometry was used to investigate discharges formed during high power impulse magnetron ...
Cathodic arc discharges have been used successfully as sources of highly ionized flux of particles i...
Purpose: The application of a common magnetron discharge to the growth of carbon nanostructures is s...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Magnetron sputtering combines a glow discharge with sputtering from a target that simultaneously ser...
Arcing phenomena was investigated in DC magnetron sputtering of AZO target. Arc count was found to d...
Diamond like carbon (DLC) is a metastable state of amorphous carbon that has very important and wide...
Arcing is a well-known, unwanted discharge regime observed on the surface of sputtering targets. The...
© 2016 Author(s). High-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carb...
Carbon films were produced by triggering a cathodic arc from a magnetron glow discharge by the appli...
The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering disc...
Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at p...
Film formation by energetic condensation has been shown to lead to well-adherent, dense films. Films...
The recent trend in thin film deposition is to prepare ceramic films capable of enduring violent env...
Investigation results of the structure, mechanical, tribological and adhesion characteristics of car...
Ion mass spectrometry was used to investigate discharges formed during high power impulse magnetron ...
Cathodic arc discharges have been used successfully as sources of highly ionized flux of particles i...
Purpose: The application of a common magnetron discharge to the growth of carbon nanostructures is s...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Magnetron sputtering combines a glow discharge with sputtering from a target that simultaneously ser...
Arcing phenomena was investigated in DC magnetron sputtering of AZO target. Arc count was found to d...