Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This work presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as Time-Zero Variability, Random Telegraph Noise, Bias Temperature Instability and Hot-Carrier Injection. The chip integrates 3,136 MOS transistors of both pMOS and nMOS types, with 8 different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the abovementioned variability effects requires. Another very important fe...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
The introduction of High-κ Metal Gate transistors led to higher integration density, low leakage cur...
Altres ajuts: this work has been supported in part by the P12-TIC-1481 Project (funded by Junta de A...
© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologi...
In nowadays deeply scaled CMOS technologies, time-zero and time-dependent variability effects have b...
In nowadays deeply scaled CMOS technologies, time-zero and time-dependent variability effects have b...
This paper presents an innovative and automated measurement setup for the characterization of variab...
.In modern nanometer-scale CMOS technologies, time-zero and time-dependent variability (TDV) effects...
Time-zero variability, bias temperature instability (BTI) and random telegraph noise (RTN) are issue...
Time-zero variability, bias temperature instability (BTI) and random telegraph noise (RTN) are issue...
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is an integral part of the electronic...
University of Minnesota Ph.D. dissertation. April 2010. Major: Electrical Engineering. Advisor: Chri...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
The introduction of High-κ Metal Gate transistors led to higher integration density, low leakage cur...
Altres ajuts: this work has been supported in part by the P12-TIC-1481 Project (funded by Junta de A...
© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologi...
In nowadays deeply scaled CMOS technologies, time-zero and time-dependent variability effects have b...
In nowadays deeply scaled CMOS technologies, time-zero and time-dependent variability effects have b...
This paper presents an innovative and automated measurement setup for the characterization of variab...
.In modern nanometer-scale CMOS technologies, time-zero and time-dependent variability (TDV) effects...
Time-zero variability, bias temperature instability (BTI) and random telegraph noise (RTN) are issue...
Time-zero variability, bias temperature instability (BTI) and random telegraph noise (RTN) are issue...
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is an integral part of the electronic...
University of Minnesota Ph.D. dissertation. April 2010. Major: Electrical Engineering. Advisor: Chri...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have become importan...
The introduction of High-κ Metal Gate transistors led to higher integration density, low leakage cur...