The growing complexity of multilayer mirrors (MLMs) calls for the development of accurate and non-destructive characterization techniques suitable for routine characterization of as-deposited MLMs with sub-nm accuracy. The classical X-ray reflectivity technique shows high sensitivity to the smallest details of a multilayer structure, but the interpretation of the measured data remains complex and in some cases non-unique, even if advanced model independent data analysis algorithms are used[1]. To reconstruct the structure of a multilayer mirror reliably a combination of X-ray reflectivity and angular dependent X-ray fluorescence data is easy to use, especially because both data sets can be measured using the same laboratory X-ray setup. The...
Determination of density of ultrathin films presents a basic challenge for the research of multilaye...
In this paper we review various improvements that we made in the development of multilayer mirror op...
The continuous downscaling of the process size for semiconductor devices pushes the junction depths ...
Structural analysis of periodic multilayers with small period thickness (~4 nm) is a challenging tas...
We present a model independent approach for the analysis of X-ray fluorescence yield modulated by an...
We present a model independent approach for the analysis of X-ray fluorescence yield modulated by an...
We present a way to analyze the chemical composition of periodical multilayer structures using the s...
Grazing-incidence X-ray reflectivity (GIXRR) is a widely used analysis method for thin films and mul...
International audienceNanolayer stacks are technologically very relevant for current and future appl...
A microstructural characterization of synthetic periodic multilayers by x-ray standing waves is pres...
We discuss a new method to characterize multilayer structures with grazing-incidence reflectivity me...
Obtaining a high quality physical description of the layered structure of multilayer based optical c...
The interfacial information of periodic multilayers can be crucial for the development of reflecting...
The research described in this thesis concerns X-ray and Extreme UV characterization of periodic nan...
GIXRF (Grazing incidence X-Ray Fluorescence) is an analytical technique with high potential in the s...
Determination of density of ultrathin films presents a basic challenge for the research of multilaye...
In this paper we review various improvements that we made in the development of multilayer mirror op...
The continuous downscaling of the process size for semiconductor devices pushes the junction depths ...
Structural analysis of periodic multilayers with small period thickness (~4 nm) is a challenging tas...
We present a model independent approach for the analysis of X-ray fluorescence yield modulated by an...
We present a model independent approach for the analysis of X-ray fluorescence yield modulated by an...
We present a way to analyze the chemical composition of periodical multilayer structures using the s...
Grazing-incidence X-ray reflectivity (GIXRR) is a widely used analysis method for thin films and mul...
International audienceNanolayer stacks are technologically very relevant for current and future appl...
A microstructural characterization of synthetic periodic multilayers by x-ray standing waves is pres...
We discuss a new method to characterize multilayer structures with grazing-incidence reflectivity me...
Obtaining a high quality physical description of the layered structure of multilayer based optical c...
The interfacial information of periodic multilayers can be crucial for the development of reflecting...
The research described in this thesis concerns X-ray and Extreme UV characterization of periodic nan...
GIXRF (Grazing incidence X-Ray Fluorescence) is an analytical technique with high potential in the s...
Determination of density of ultrathin films presents a basic challenge for the research of multilaye...
In this paper we review various improvements that we made in the development of multilayer mirror op...
The continuous downscaling of the process size for semiconductor devices pushes the junction depths ...