session posterInternational audienceIn this paper we use a statistical analysis of NBTI stress and recoverable components measured on Pfet devices issued from ST Microelectronics 28nm FDSOI technology. NBTI degradation and recovery resulting from AC and DC stress are measured at μs time scale. Statistical analysis of the permanent and recoverable components are performed separately. A Dual Defect Centric Model (DDCM) accounting for these two components is also proposed
The microelectronics industry is able to design transistors reaching dimensions of the order of ten ...
We experimentally and theoretically investigate the NBTI degradation of pMOS devices due to analog s...
A comprehensive modeling framework is presented to predict the time kinetics of negative bias temper...
session posterInternational audienceIn this paper we use a statistical analysis of NBTI stress and r...
session 8: Large StatisticsInternational audienceIn this paper, we present a statistical analysis of...
session posterInternational audienceIn this paper, we propose a qualitative analysis of NBTI recover...
International audienceIn this paper we present NBTI stress and recovery effects measured on PFET dev...
We investigate the NBTI degradation and recovery of pMOSFETs under continuously varying analog-circu...
A comprehensive modeling framework is proposed to explain NBTI degradation during DC stress, recover...
Five signatures of NBTI such as strong gate insulator process dependence, universal rate of long-tim...
The microelectronics industry is able to design transistors reaching dimensions of the order of ten ...
We experimentally and theoretically investigate the NBTI degradation of pMOS devices due to analog s...
A comprehensive modeling framework is presented to predict the time kinetics of negative bias temper...
session posterInternational audienceIn this paper we use a statistical analysis of NBTI stress and r...
session 8: Large StatisticsInternational audienceIn this paper, we present a statistical analysis of...
session posterInternational audienceIn this paper, we propose a qualitative analysis of NBTI recover...
International audienceIn this paper we present NBTI stress and recovery effects measured on PFET dev...
We investigate the NBTI degradation and recovery of pMOSFETs under continuously varying analog-circu...
A comprehensive modeling framework is proposed to explain NBTI degradation during DC stress, recover...
Five signatures of NBTI such as strong gate insulator process dependence, universal rate of long-tim...
The microelectronics industry is able to design transistors reaching dimensions of the order of ten ...
We experimentally and theoretically investigate the NBTI degradation of pMOS devices due to analog s...
A comprehensive modeling framework is presented to predict the time kinetics of negative bias temper...