Data set for Hybrid top-down/bottom-up fabrication of highly uniform and organized faceted AlN nanorod scaffold

This dataset contains scanning electron microscopy (SEM) images, transmission electron microscopy (TEM) pictures and Catodoluminescence (CL) measurements carried out on AlN nanorod. The samples were fabricated via a hybrid top-down/bottom up approach. Displacement Talbot Lithography is used to fabricate Au/Ni metal dots to act as a hard etch mask. Ultrathin AlN nanorod arrays are created thanks to a two-step dry-wet etching process with first, chlorine-based dry etching of an AlN template and second, KOH-based wet etching. AlN facet recovery is performed by Metal Organic Vapor Phase Epitaxy for various regrowth time. TEM and CL were used to assess the structural and optical quality of the AlN nanorod, respectively.Secondary electron images were captured using a Hitachi S-4300 scanning electron microscope (SEM). An accelerating voltage of 5 kV was used to collect the images. Transmission electron microscopy (TEM) images were captured using a JEOL 2100 with an accelerating voltage of 5kV. All acquisition has been performed along the [10-10] zone axis. Cathodoluminescence hyperspectral imaging measurements were carried out at room temperature in a modified FEI Quanta 250 field emission SEM using electron energies of 15.0 keV and beam currents of approximately 7 nA. Light was collected using an NA 0.28 reflecting objective with its axis perpendicular to the electron beam and focused directly on the entrance of the spectrograph using an off-axis paraboloidal mirror. We used a 125 mm focal length spectrograph with a 600 lines/mm grating and 50 μm entrance slit, coupled to a cooled electron multiplying charge-coupled device (EMCCD) detector.The nanorod investigated by TEM were mechanically removed from the substrate in an ultrasonic bath and then dispersed on a carbon grid