Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition

Title: Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition Author: Peter Pira Department: Department of Surface and Plasma Science Supervisor: doc. RNDr. Jan Wild, CSc., Department of Surface and Plasma Science Abstract: The paper deals with the first results of the interaction of a desk-top high repetition rate XUV laser (wavelength of 46.9 nm) radiation with materials suitable for optoelectronics, in particular the ionic crystals CsI, LiF, etc. Using surface physics methods (AFM, DIC Normanski microscopy) pulse laser imprints were investigated. Based on the results obtained, general information on the nature of ablation and desorption was obtained, which were compared with the results of the XUV-ABLATOR modified code modeling. Plasma arising from ablation was examined by a modified Langmuir probe system. The main result is the pulse laser deposition of thin films of Bi and CsI. Keywords: ablation, Pulsed Laser Deposition, XUV lase