Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O3 (PZT)-based capacitors have been studied using piezoresponse force microscopy. Visualization of polarization distribution and d33-loop measurements in individual 1x1.5-μm2 capacitors before and after stress application, generated by substrate bending, provided direct experimental evidence of stress-induced switching. Mechanical stress caused elastic switching in capacitors with the direction of the resulting polarization determined by the sign of the applied stress. In addition, stress application turned capacitors into a heavily imprinted state characterized by strongly shifted hysteresis loops and almost complete backswitching after application of t...
Switching and imprint effects as a function of fatigue in Pt-PZT-Pt ferroelectric capacitors (FeCap)...
Ferroelectric (FE) HfO₂-based thin films, which are considered as one of the most promising material...
Ferroelectric thin films develop large residual stresses and preferred crystallographic orientation ...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O3 (PZT)-bas...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O-3 (PZT)-ba...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O-3 (PZT)-ba...
Piezoresponse force microscopy has been used to perform nanoscale characterization of the spatial va...
Piezoresponse force microscopy has been used to perform nanoscale characterization of the spatial va...
Piezoresponse force microscopy (PFM) has been used to study the polarization stability in micrometer...
Piezoresponse force microscopy (PFM) has been used to study the polarization stability in micrometer...
A mechanism for the switching behavior of (111)-oriented Pb(Zr,Ti)O3-based 1×1.5 μm2 capacitors has ...
A mechanism for the switching behavior of (111)-oriented Pb(Zr, Ti)O3-based 1 × 1.5 μm2 capacitors h...
A mechanism for the switching behavior of (111)-oriented Pb(Zr, Ti)O3-based 1 × 1.5 μm2 capacitors h...
A mechanism for the switching behavior of (111)-oriented Pb(Zr,Ti)O3-based 1×1.5 μm2 capacitors has ...
Ferroelectric (FE) HfO₂-based thin films, which are considered as one of the most promising material...
Switching and imprint effects as a function of fatigue in Pt-PZT-Pt ferroelectric capacitors (FeCap)...
Ferroelectric (FE) HfO₂-based thin films, which are considered as one of the most promising material...
Ferroelectric thin films develop large residual stresses and preferred crystallographic orientation ...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O3 (PZT)-bas...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O-3 (PZT)-ba...
Stress-induced changes in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O-3 (PZT)-ba...
Piezoresponse force microscopy has been used to perform nanoscale characterization of the spatial va...
Piezoresponse force microscopy has been used to perform nanoscale characterization of the spatial va...
Piezoresponse force microscopy (PFM) has been used to study the polarization stability in micrometer...
Piezoresponse force microscopy (PFM) has been used to study the polarization stability in micrometer...
A mechanism for the switching behavior of (111)-oriented Pb(Zr,Ti)O3-based 1×1.5 μm2 capacitors has ...
A mechanism for the switching behavior of (111)-oriented Pb(Zr, Ti)O3-based 1 × 1.5 μm2 capacitors h...
A mechanism for the switching behavior of (111)-oriented Pb(Zr, Ti)O3-based 1 × 1.5 μm2 capacitors h...
A mechanism for the switching behavior of (111)-oriented Pb(Zr,Ti)O3-based 1×1.5 μm2 capacitors has ...
Ferroelectric (FE) HfO₂-based thin films, which are considered as one of the most promising material...
Switching and imprint effects as a function of fatigue in Pt-PZT-Pt ferroelectric capacitors (FeCap)...
Ferroelectric (FE) HfO₂-based thin films, which are considered as one of the most promising material...
Ferroelectric thin films develop large residual stresses and preferred crystallographic orientation ...