Fabrication of 200 mm Germanium-On-Insulator (GeOI): A step toward a Germanium photonic platform
- Reboud, V.
- Widiez, J.
- Hartmann, J.
- Gomez, E.
- Gassenq, A.
- Guilloy, K.
- Bertrand, M.
- Tardif, S.
- Escalante, J.
- Pauc, N.
- Fowler, D.
- Bellet Amalric, E.
- Rouchon, D.
- Duchemin, I.
- Niquet, M.
- Rieutord, F.
- Geiger, R.
- Zabel, T.
- Marin, E.
- Sigg, H.
- Faist, J.
- Chelnokov, A.
- Calvo, V.
Publication date
August 2016
DOI Publisher
Institute of Electrical and Electronics Engineers (IEEE)Abstract
International audienceUsing the Smart CutTM technology, we fabricated 200 mm optical Germanium-On-Insulator (GeOI) substrates for photonic applications. The high crystalline quality of the Ge layer opens the way to wafer-scale fabrication of photonic components such as new light emitting devices based on highly-tensile strain
Add to ORKG