The scalable, high-throughput, cost-effective synthesis of high-quality tetragonal tellurium (t-Te) nanowires by the galvanic displacement reaction of Si on a 4-in. Si wafer is demonstrated. This method does not require any heterogeneous seeds, physical templates, or surfactants. In addition, because seed nucleation and growth are both instantaneous, the synthesized nanowires had uniform lengths across the substrate. Furthermore, the effects of the deposition conditions, including the solution composition and reaction time and temperature, on the morphologies, dimensions, and crystallinities of the Te nanowires were analyzed to investigate the growth mechanism. The synthesized t-Te nanowires exhibited excellent piezoelectric properties, wit...
International audienceTemplate-free electrodeposition of high aspect ratio Te nanowires is presented...
We report the controlled growth of highly ordered and well aligned one-dimensional tellurium nanostr...
Supercritical fluid electrodeposition (SCFED) was employed for rapid deposition (2.5 μm min−1) of te...
Tellurium (Te) nanostructures, including nanowires and branched nanorods, were synthesized by galvan...
Tellurium, a p-type semiconductor with a narrow bandgap of 0.35eV, has a preferential growth in one ...
Tellurium nanostructures were synthesized by galvanic displacement reaction (GDR) of aluminum in an ...
Single crystalline nanorods and nanowires of t-Te have been prepared by a simple solution route. Th...
One-dimensional tellurium nanostructures can exhibit distinct electronic properties from those seen ...
10.1016/j.matchemphys.2008.07.101Materials Chemistry and Physics1132-3523-526MCHP
Single crystalline nanorods and nanowires of t-Te have been prepared by a simple solution route. The...
Single crystalline tellurium nanowires were successfully synthesized in large scale by a facile appr...
International audienceWe report template-free electrodeposition of tellurium (Te) 1D nanostructures ...
International audienceTellurium and its alloys are used in many applications such as photoconductors...
We herein report a gas-solid transformation mechanism for the surfactant-free synthesis of Te NWs at...
Electrochemical deposition of tellurium from deep eutectic solvents (DES) at gold film electrodes pr...
International audienceTemplate-free electrodeposition of high aspect ratio Te nanowires is presented...
We report the controlled growth of highly ordered and well aligned one-dimensional tellurium nanostr...
Supercritical fluid electrodeposition (SCFED) was employed for rapid deposition (2.5 μm min−1) of te...
Tellurium (Te) nanostructures, including nanowires and branched nanorods, were synthesized by galvan...
Tellurium, a p-type semiconductor with a narrow bandgap of 0.35eV, has a preferential growth in one ...
Tellurium nanostructures were synthesized by galvanic displacement reaction (GDR) of aluminum in an ...
Single crystalline nanorods and nanowires of t-Te have been prepared by a simple solution route. Th...
One-dimensional tellurium nanostructures can exhibit distinct electronic properties from those seen ...
10.1016/j.matchemphys.2008.07.101Materials Chemistry and Physics1132-3523-526MCHP
Single crystalline nanorods and nanowires of t-Te have been prepared by a simple solution route. The...
Single crystalline tellurium nanowires were successfully synthesized in large scale by a facile appr...
International audienceWe report template-free electrodeposition of tellurium (Te) 1D nanostructures ...
International audienceTellurium and its alloys are used in many applications such as photoconductors...
We herein report a gas-solid transformation mechanism for the surfactant-free synthesis of Te NWs at...
Electrochemical deposition of tellurium from deep eutectic solvents (DES) at gold film electrodes pr...
International audienceTemplate-free electrodeposition of high aspect ratio Te nanowires is presented...
We report the controlled growth of highly ordered and well aligned one-dimensional tellurium nanostr...
Supercritical fluid electrodeposition (SCFED) was employed for rapid deposition (2.5 μm min−1) of te...