International audienceA new full gate voltage range methodology using a Lambert W function based inversion charge model, for extracting the electrical parameters in FDSOI nano-MOSFET devices, has been developed. Split capacitance–voltage measurements carried out on 14 nm technology FDSOI devices show that the inversion charge variation with gate voltage can be well described by a Lambert W function. Based on the drain current equation in the linear region including the inversion charge described by the Lambert function of gate voltage and the standard mobility equation enables five electrical MOSFET parameters to be extracted from experimental Id–Vg measurements (ideality factor, threshold voltage, low field mobility, first and second order...
by Tse Man Siu.Thesis (M.Phil.)--Chinese University of Hong Kong, 1988.Bibliography: leaves 203-210
A new procedure is presented to separate and extract source-and-drain series resistance and mobility...
This article provides a unified look at MOSFET model parameter extraction methods that rely on the a...
International audienceA new full gate voltage range methodology using a Lambert W function based inv...
International audienceThe applicability of the Lambert-W function-based parameter extraction methodo...
session posterInternational audienceA full front gate voltage range parameter extraction technique i...
International audienceA new parameter extraction methodology based on split C-V is proposed for FDSO...
International audienceA new Y-function based MOSFET parameter extraction method is proposed. This me...
session A2L-E: Electrical Characterization of Advanced TechnologiesInternational audienceFDSOI techn...
International audienceFDSOI technologies are very promising candidates for future CMOS circuits as t...
International audienceThe feasibility of full split C–V method in ultra-thin body and BOX (UTBB) FDS...
The forward gated-diode method is used in this paper to extract the dielectric oxide thickness and b...
International audienceThis paper presents a new method for the series resistance extraction in ultim...
International audienceEffective work function and equivalent oxide thickness are fundamental paramet...
by Tse Man Siu.Thesis (M.Phil.)--Chinese University of Hong Kong, 1988.Bibliography: leaves 203-210
A new procedure is presented to separate and extract source-and-drain series resistance and mobility...
This article provides a unified look at MOSFET model parameter extraction methods that rely on the a...
International audienceA new full gate voltage range methodology using a Lambert W function based inv...
International audienceThe applicability of the Lambert-W function-based parameter extraction methodo...
session posterInternational audienceA full front gate voltage range parameter extraction technique i...
International audienceA new parameter extraction methodology based on split C-V is proposed for FDSO...
International audienceA new Y-function based MOSFET parameter extraction method is proposed. This me...
session A2L-E: Electrical Characterization of Advanced TechnologiesInternational audienceFDSOI techn...
International audienceFDSOI technologies are very promising candidates for future CMOS circuits as t...
International audienceThe feasibility of full split C–V method in ultra-thin body and BOX (UTBB) FDS...
The forward gated-diode method is used in this paper to extract the dielectric oxide thickness and b...
International audienceThis paper presents a new method for the series resistance extraction in ultim...
International audienceEffective work function and equivalent oxide thickness are fundamental paramet...
by Tse Man Siu.Thesis (M.Phil.)--Chinese University of Hong Kong, 1988.Bibliography: leaves 203-210
A new procedure is presented to separate and extract source-and-drain series resistance and mobility...
This article provides a unified look at MOSFET model parameter extraction methods that rely on the a...