In this chapter, silicon electrochemical micromachining (ECM) technology is reviewed with particular emphasis to the fabrication of complex microstructures and microsystems, as well as to their applications in optofluidics, biosensing, photonics, and medical fields. ECM, which is based on the controlled electrochemical dissolution of n-type silicon under backside illumination in acidic (HF-based) electrolytes, enables microstructuring of silicon wafers to be controlled up to the higher aspect ratios (over 100) with sub-micrometer accuracy, thus pushing silicon micromachining well beyond up-to-date both wet and dry microstructuring technologies. Both basic and advanced features of ECM technology are described and discussed by taking the fabr...
In this paper photo-electrochemical etching of silicon in HF-based solutions is employed as a versat...
This chapter explores the micromachining of fluidic structures in silicon, and presents several exam...
Since the famous talk of R. Feynman in 1959 “There is plenty of room at the bottom”, silicon nano an...
In this chapter, silicon electrochemical micromachining (ECM) technology is reviewed with particular...
In this chapter, silicon electrochemical micromachining (ECM) technology is reviewed with particular...
Silicon electrochemical micromachining technology (ECM) has come a long way since the pioneering pap...
It is shown that silicon microstructures and microsystems of high complexity can be effectively fabr...
Electrochemical micromachining technology, namely ECM, is a newly proposed microstructuring techniqu...
In this paper the electrochemical silicon etching in HF-based solution is demonstrated as a new tech...
Is it feasible to fabricate advanced silicon microstructures and microsystems for (bio)sensing appli...
In this work, a significant step towards the fabrication of very high aspect-ratio complex microsyst...
In this work, a significant step towards the fabrication of very high aspect-ratio complex microsyst...
Electrochemical micromachining (ECM) of p-type Si substrates is accomplished in HF-based solutions b...
Porous silicon produced by electrochemical etching of silicon has become one of the most popular mat...
AbstractIn this work, a significant step towards the fabrication of very high aspect-ratio complex m...
In this paper photo-electrochemical etching of silicon in HF-based solutions is employed as a versat...
This chapter explores the micromachining of fluidic structures in silicon, and presents several exam...
Since the famous talk of R. Feynman in 1959 “There is plenty of room at the bottom”, silicon nano an...
In this chapter, silicon electrochemical micromachining (ECM) technology is reviewed with particular...
In this chapter, silicon electrochemical micromachining (ECM) technology is reviewed with particular...
Silicon electrochemical micromachining technology (ECM) has come a long way since the pioneering pap...
It is shown that silicon microstructures and microsystems of high complexity can be effectively fabr...
Electrochemical micromachining technology, namely ECM, is a newly proposed microstructuring techniqu...
In this paper the electrochemical silicon etching in HF-based solution is demonstrated as a new tech...
Is it feasible to fabricate advanced silicon microstructures and microsystems for (bio)sensing appli...
In this work, a significant step towards the fabrication of very high aspect-ratio complex microsyst...
In this work, a significant step towards the fabrication of very high aspect-ratio complex microsyst...
Electrochemical micromachining (ECM) of p-type Si substrates is accomplished in HF-based solutions b...
Porous silicon produced by electrochemical etching of silicon has become one of the most popular mat...
AbstractIn this work, a significant step towards the fabrication of very high aspect-ratio complex m...
In this paper photo-electrochemical etching of silicon in HF-based solutions is employed as a versat...
This chapter explores the micromachining of fluidic structures in silicon, and presents several exam...
Since the famous talk of R. Feynman in 1959 “There is plenty of room at the bottom”, silicon nano an...