With continued technology scaling, process variations will be especially detrimental to six-transistor static memory structures (6T SRAMs). A memory architecture using three-transistor, one-diode DRAM (3T1D) cells in the L1 data cache tolerates wide process variations with little performance degradation, making it a promising choice for on-chip cache structures for next-generation microprocessors.Peer ReviewedPostprint (published version
Memory circuits are playing a key role in complex multicore systems with both data and instructions ...
This thesis presents a novel six-transistor SRAM intended for advanced microprocessor cache applicat...
As technology scales, more sophisticated fabrication processes cause variations in many different pa...
With continued technology scaling, process variations will be especially detrimental to six-transist...
3T1D cell has been stated as a valid alternative to be implemented on L1 memory cache to substitute ...
On-chip memories consume a significant portion of the overall die space and power in modern micropro...
Process variations in integrated circuits have significant impact on their performance, leakage and ...
As the semiconductor process technology continues to scale deeper into the nanometer region, the int...
Best DCIS Paper Award 20123T1D cell has been stated as a valid alternative to be implemented on L1 m...
Process parameter variations are expected to be significantly high in a sub-50-nm technology regime,...
Aggressive technology scaling to 14 nm technology node increases variability in transistors performa...
Abstract—In this paper we present the “Variation Trained Drowsy Cache ” (VTD-Cache) architecture. VT...
As the CMOS technology continues to scale down to achieve higher performance, considerable power dis...
textOne of the major limiters to computer systems and systems on chip (SOC) designs is accessing the...
As transistor feature sizes continue to shrink into the sub-90nm range and beyond, the effects of pr...
Memory circuits are playing a key role in complex multicore systems with both data and instructions ...
This thesis presents a novel six-transistor SRAM intended for advanced microprocessor cache applicat...
As technology scales, more sophisticated fabrication processes cause variations in many different pa...
With continued technology scaling, process variations will be especially detrimental to six-transist...
3T1D cell has been stated as a valid alternative to be implemented on L1 memory cache to substitute ...
On-chip memories consume a significant portion of the overall die space and power in modern micropro...
Process variations in integrated circuits have significant impact on their performance, leakage and ...
As the semiconductor process technology continues to scale deeper into the nanometer region, the int...
Best DCIS Paper Award 20123T1D cell has been stated as a valid alternative to be implemented on L1 m...
Process parameter variations are expected to be significantly high in a sub-50-nm technology regime,...
Aggressive technology scaling to 14 nm technology node increases variability in transistors performa...
Abstract—In this paper we present the “Variation Trained Drowsy Cache ” (VTD-Cache) architecture. VT...
As the CMOS technology continues to scale down to achieve higher performance, considerable power dis...
textOne of the major limiters to computer systems and systems on chip (SOC) designs is accessing the...
As transistor feature sizes continue to shrink into the sub-90nm range and beyond, the effects of pr...
Memory circuits are playing a key role in complex multicore systems with both data and instructions ...
This thesis presents a novel six-transistor SRAM intended for advanced microprocessor cache applicat...
As technology scales, more sophisticated fabrication processes cause variations in many different pa...