Pseudodielectric functions (ε) = (ε1) + i (ε2) of GaAs were measured by spectroscopic ellipsometry (SE), in the range of 1.W.45 eV, at temperatures from room temperature (RT) to ~610 ° C. A very clean, smooth surface was obtained by first growing an epitaxial layer of GaAs on a GaAs substrate and immediately capping it with a protective layer of arsenic. The cap prevented surface oxidation during transport to the measurement chamber, where it was evaporated under ultrahigh vacuum at ~350 °C. Room-temperature SE results from this surface are in good agreement with those in the literature obtained by wet-chemical etching. A quantitative analysis of the (ε) spectrum was made using the harmonic-oscillator approximation (HOA). It is shown by the...
A comprehensive characterization, including room temperature Hall effect, near infrared absorption, ...
International audienceSpectroscopic Ellipsometry (SE) is used in this work to investigate the optica...
Optical reflection measurement techniques such as ellipsometry and reflectometry are commonly used t...
The optical constants of Ga0.51In0.49P have been determined from 0.8 to 5.0 eV using variable-angle ...
Photoellipsometry, a new contactless optical method, is presented, Related to photoreflectance, this...
The optical constants of GaAs substrates have been determined by ellipsometry for λ = 5 461 Å. They ...
The temperature dependence of the optical absorption edge (Urbach edge) is measured in semi-insulat...
Using variable angle spectroscopic ellipsometry, optical constants for AlAs (1.4-5.0 eV) are present...
doi:10.1063/1.360477A study of biaxial strain as a function of temperature in a ZnSe epilayer grown ...
In0.49Ga0.51P films, both undoped and doped n- and p-type (up to 1018 cm-3), were grown lattice matc...
Values of the temperature coefficient of the refractive index were obtained from the derivation of a...
We have determined that the temperature for desorption of gallium oxide from GaAs increases linearly...
Infrared spectroscopic ellipsometry is used to characterize the structure of molecular-beam-epitaxia...
We summarize recent applications of two real-time optical diagnostic techniques, reflectance differe...
We present an approach that takes into account lattice dynamical effects in calculating the optical ...
A comprehensive characterization, including room temperature Hall effect, near infrared absorption, ...
International audienceSpectroscopic Ellipsometry (SE) is used in this work to investigate the optica...
Optical reflection measurement techniques such as ellipsometry and reflectometry are commonly used t...
The optical constants of Ga0.51In0.49P have been determined from 0.8 to 5.0 eV using variable-angle ...
Photoellipsometry, a new contactless optical method, is presented, Related to photoreflectance, this...
The optical constants of GaAs substrates have been determined by ellipsometry for λ = 5 461 Å. They ...
The temperature dependence of the optical absorption edge (Urbach edge) is measured in semi-insulat...
Using variable angle spectroscopic ellipsometry, optical constants for AlAs (1.4-5.0 eV) are present...
doi:10.1063/1.360477A study of biaxial strain as a function of temperature in a ZnSe epilayer grown ...
In0.49Ga0.51P films, both undoped and doped n- and p-type (up to 1018 cm-3), were grown lattice matc...
Values of the temperature coefficient of the refractive index were obtained from the derivation of a...
We have determined that the temperature for desorption of gallium oxide from GaAs increases linearly...
Infrared spectroscopic ellipsometry is used to characterize the structure of molecular-beam-epitaxia...
We summarize recent applications of two real-time optical diagnostic techniques, reflectance differe...
We present an approach that takes into account lattice dynamical effects in calculating the optical ...
A comprehensive characterization, including room temperature Hall effect, near infrared absorption, ...
International audienceSpectroscopic Ellipsometry (SE) is used in this work to investigate the optica...
Optical reflection measurement techniques such as ellipsometry and reflectometry are commonly used t...